Laminated CeO2/HfO2 High-K Gate Dielectrics Grown by Pulsed Laser Deposition in Reducing Ambient

Koray Karakaya; Beatriz Barcones; Andrei Zinine; Chris Rittersma; Peter Graat; Jurgen van Berkum; Marcel Verheijen; Guus Rijnders; Dave Blank

doi:10.1149/1.2355739

Laminated CeO2/HfO2 High-K Gate Dielectrics Grown by Pulsed Laser Deposition in Reducing Ambient

ECS Transactions ◽

10.1149/1.2355739 ◽

2019 ◽

Vol 3 (3) ◽

pp. 521-533 ◽

Cited By ~ 1

Author(s):

Koray Karakaya ◽

Beatriz Barcones ◽

Andrei Zinine ◽

Chris Rittersma ◽

Peter Graat ◽

...

Keyword(s):

Pulsed Laser Deposition ◽

Gate Dielectrics ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Laminated CeO2/HfO2 High-K Gate Dielectrics Grown by Pulsed Laser Deposition in Reducing Ambient

ECS Meeting Abstracts ◽

10.1149/ma2006-02/22/1133 ◽

2006 ◽

Keyword(s):

Pulsed Laser Deposition ◽

Gate Dielectrics ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Characterization of Laminated CeO[sub 2]–HfO[sub 2] High-k Gate Dielectrics Grown by Pulsed Laser Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2266454 ◽

2006 ◽

Vol 153 (10) ◽

pp. F233 ◽

Cited By ~ 10

Author(s):

K. Karakaya ◽

A. Zinine ◽

J. G. M. van Berkum ◽

M. A. Verheijen ◽

Z. M. Rittersma ◽

...

Keyword(s):

Pulsed Laser Deposition ◽

Gate Dielectrics ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Characterization of Laminated CeO2-HfO2 High-k Gate Dielectrics Deposited by Pulsed Laser Deposition

ECS Meeting Abstracts ◽

10.1149/ma2005-01/14/646 ◽

2005 ◽

Keyword(s):

Pulsed Laser Deposition ◽

Gate Dielectrics ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Epitaxial La[sub 2]Hf[sub 2]O[sub 7] thin films on Si(001) substrates grown by pulsed laser deposition for high-k gate dielectrics

Applied Physics Letters ◽

10.1063/1.2828692 ◽

2008 ◽

Vol 92 (1) ◽

pp. 012901 ◽

Cited By ~ 19

Author(s):

Feng Wei ◽

Hailing Tu ◽

Yi Wang ◽

Shoujing Yue ◽

Jun Du

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Gate Dielectrics ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Thermal stability and electrical properties of Zr silicate films for high-k gate-dielectric applications, as prepared by pulsed laser deposition

Applied Physics A ◽

10.1007/s00339-003-2187-4 ◽

2005 ◽

Vol 80 (2) ◽

pp. 321-324 ◽

Cited By ~ 7

Author(s):

J. Zhu ◽

Z.G. Liu ◽

M. Zhu ◽

G.L. Yuan ◽

J.M. Liu

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Pulsed Laser Deposition ◽

Gate Dielectric ◽

Pulsed Laser ◽

Laser Deposition ◽

High K ◽

High K Gate Dielectric

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Multilevel Resistive Memory Switching in Amorphous Ternary High K-Dielectric Oxide LaGdO3 Thin Films Grown By Pulsed Laser Deposition

ECS Meeting Abstracts ◽

10.1149/ma2014-01/39/1466 ◽

2014 ◽

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Resistive Memory ◽

Memory Switching ◽

High K ◽

High K Dielectric

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Pulsed laser deposition of oxide gate dielectrics for pentacene organic field-effect transistors

Thin Solid Films ◽

10.1016/j.tsf.2004.11.227 ◽

2005 ◽

Vol 486 (1-2) ◽

pp. 218-221 ◽

Cited By ~ 27

Author(s):

S. Yaginuma ◽

J. Yamaguchi ◽

K. Itaka ◽

H. Koinuma

Keyword(s):

Pulsed Laser Deposition ◽

Field Effect ◽

Gate Dielectrics ◽

Field Effect Transistors ◽

Pulsed Laser ◽

Laser Deposition ◽

Organic Field Effect Transistors

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Low-temperature growth of high-k thin films by ultraviolet-assisted pulsed laser deposition

Applied Surface Science ◽

10.1016/s0169-4332(00)00615-2 ◽

2000 ◽

Vol 168 (1-4) ◽

pp. 123-126 ◽

Cited By ~ 11

Author(s):

V. Craciun ◽

J.M. Howard ◽

N.D. Bassim ◽

R.K. Singh

Keyword(s):

Thin Films ◽

Low Temperature ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Temperature Growth ◽

Low Temperature Growth ◽

High K

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Low operating voltage InGaZnO thin-film transistors based on Al2O3 high-k dielectrics fabricated using pulsed laser deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.64.1437 ◽

2014 ◽

Vol 64 (10) ◽

pp. 1437-1440 ◽

Cited By ~ 3

Author(s):

G. Z. Geng ◽

G. X. Liu ◽

Q. Zhang ◽

F. K. Shan ◽

W. J. Lee ◽

...

Keyword(s):

Thin Film ◽

Pulsed Laser Deposition ◽

Thin Film Transistors ◽

Pulsed Laser ◽

Laser Deposition ◽

Operating Voltage ◽

High K

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Phase separation and interfacial reaction of high-k HfAlOx films prepared by pulsed-laser deposition in oxygen-deficient ambient

Applied Physics Letters ◽

10.1063/1.2168505 ◽

2006 ◽

Vol 88 (7) ◽

pp. 072906 ◽

Cited By ~ 25

Author(s):

X. Y. Qiu ◽

H. W. Liu ◽

F. Fang ◽

M. J. Ha ◽

J.-M. Liu

Keyword(s):

Phase Separation ◽

Pulsed Laser Deposition ◽

Interfacial Reaction ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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