Characterization of Laminated CeO[sub 2]–HfO[sub 2] High-k Gate Dielectrics Grown by Pulsed Laser Deposition
2006 ◽
Vol 153
(10)
◽
pp. F233
◽
Keyword(s):
Keyword(s):
2021 ◽
Vol 127
◽
pp. 105716
2010 ◽
Vol 75
◽
pp. 202-207
2001 ◽
Vol 206-213
◽
pp. 531-534