Phase separation and interfacial reaction of high-k HfAlOx films prepared by pulsed-laser deposition in oxygen-deficient ambient

X. Y. Qiu; H. W. Liu; F. Fang; M. J. Ha; J.-M. Liu

doi:10.1063/1.2168505

Phase separation and interfacial reaction of high-k HfAlOx films prepared by pulsed-laser deposition in oxygen-deficient ambient

Applied Physics Letters ◽

10.1063/1.2168505 ◽

2006 ◽

Vol 88 (7) ◽

pp. 072906 ◽

Cited By ~ 25

Author(s):

X. Y. Qiu ◽

H. W. Liu ◽

F. Fang ◽

M. J. Ha ◽

J.-M. Liu

Keyword(s):

Phase Separation ◽

Pulsed Laser Deposition ◽

Interfacial Reaction ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Thermal stability and electrical properties of Zr silicate films for high-k gate-dielectric applications, as prepared by pulsed laser deposition

Applied Physics A ◽

10.1007/s00339-003-2187-4 ◽

2005 ◽

Vol 80 (2) ◽

pp. 321-324 ◽

Cited By ~ 7

Author(s):

J. Zhu ◽

Z.G. Liu ◽

M. Zhu ◽

G.L. Yuan ◽

J.M. Liu

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Pulsed Laser Deposition ◽

Gate Dielectric ◽

Pulsed Laser ◽

Laser Deposition ◽

High K ◽

High K Gate Dielectric

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Multilevel Resistive Memory Switching in Amorphous Ternary High K-Dielectric Oxide LaGdO3 Thin Films Grown By Pulsed Laser Deposition

ECS Meeting Abstracts ◽

10.1149/ma2014-01/39/1466 ◽

2014 ◽

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Resistive Memory ◽

Memory Switching ◽

High K ◽

High K Dielectric

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Low-temperature growth of high-k thin films by ultraviolet-assisted pulsed laser deposition

Applied Surface Science ◽

10.1016/s0169-4332(00)00615-2 ◽

2000 ◽

Vol 168 (1-4) ◽

pp. 123-126 ◽

Cited By ~ 11

Author(s):

V. Craciun ◽

J.M. Howard ◽

N.D. Bassim ◽

R.K. Singh

Keyword(s):

Thin Films ◽

Low Temperature ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Temperature Growth ◽

Low Temperature Growth ◽

High K

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Low operating voltage InGaZnO thin-film transistors based on Al2O3 high-k dielectrics fabricated using pulsed laser deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.64.1437 ◽

2014 ◽

Vol 64 (10) ◽

pp. 1437-1440 ◽

Cited By ~ 3

Author(s):

G. Z. Geng ◽

G. X. Liu ◽

Q. Zhang ◽

F. K. Shan ◽

W. J. Lee ◽

...

Keyword(s):

Thin Film ◽

Pulsed Laser Deposition ◽

Thin Film Transistors ◽

Pulsed Laser ◽

Laser Deposition ◽

Operating Voltage ◽

High K

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Interfacial reaction control and its mechanism of AlN epitaxial films grown on Si(111) substrates by pulsed laser deposition

Scientific Reports ◽

10.1038/srep11480 ◽

2015 ◽

Vol 5 (1) ◽

Cited By ~ 16

Author(s):

Wenliang Wang ◽

Weijia Yang ◽

Zuolian Liu ◽

Haiyan Wang ◽

Lei Wen ◽

...

Keyword(s):

Pulsed Laser Deposition ◽

Interfacial Reaction ◽

Pulsed Laser ◽

Epitaxial Films ◽

Laser Deposition

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Phase separation in oxygen deficient gallium oxide films grown by pulsed-laser deposition

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2011.12.078 ◽

2012 ◽

Vol 133 (1) ◽

pp. 135-139 ◽

Cited By ~ 16

Author(s):

C. Hebert ◽

A. Petitmangin ◽

J. Perrière ◽

E. Millon ◽

A. Petit ◽

...

Keyword(s):

Phase Separation ◽

Pulsed Laser Deposition ◽

Gallium Oxide ◽

Oxide Films ◽

Pulsed Laser ◽

Laser Deposition

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Preparation by pulsed laser deposition and characterization of ZrO/sub 2/, HfO/sub 2/ and PrO/sub x/ thin films for high-k gate insulator

Proceedings of the 13th IEEE International Symposium on Applications of Ferroelectrics, 2002. ISAF 2002. ◽

10.1109/isaf.2002.1195904 ◽

2003 ◽

Author(s):

T. Kanashima ◽

S. Kaitai ◽

M. Sohgawa ◽

H. Kanda ◽

M. Okuyama

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Gate Insulator ◽

Laser Deposition ◽

High K

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Dielectric properties of YSZ high-k thin films fabricated at low temperature by pulsed laser deposition

Materials Letters ◽

10.1016/s0167-577x(03)00306-9 ◽

2003 ◽

Vol 57 (26-27) ◽

pp. 4297-4301 ◽

Cited By ~ 23

Author(s):

J. Zhu ◽

Z.G. Liu

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Low Temperature ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Preparation and Characterization of High-k Lanthanoid Oxide Thin Films Deposited by Pulsed Laser Deposition

10.7567/ssdm.2001.b-8-5 ◽

2001 ◽

Author(s):

Satoshi Kitai ◽

Osamu Maida ◽

Takeshi Kanashima ◽

Masanori Okuyama

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Oxide Thin Films ◽

High K

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Pulsed laser deposition of HfO2 and PrxOy high-k films on Si(100)

Applied Surface Science ◽

10.1016/j.apsusc.2005.01.094 ◽

2005 ◽

Vol 247 (1-4) ◽

pp. 128-133 ◽

Cited By ~ 14

Author(s):

M. Ratzke ◽

D. Wolfframm ◽

M. Kappa ◽

S. Kouteva-Arguirova ◽

J. Reif

Keyword(s):

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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