Epitaxial La[sub 2]Hf[sub 2]O[sub 7] thin films on Si(001) substrates grown by pulsed laser deposition for high-k gate dielectrics

2008 ◽  
Vol 92 (1) ◽  
pp. 012901 ◽  
Author(s):  
Feng Wei ◽  
Hailing Tu ◽  
Yi Wang ◽  
Shoujing Yue ◽  
Jun Du
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Gate Dielectrics ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
High K

Characterization of Laminated CeO[sub 2]–HfO[sub 2] High-k Gate Dielectrics Grown by Pulsed Laser Deposition

2006 ◽  
Vol 153 (10) ◽  
pp. F233 ◽  
Author(s):  
K. Karakaya ◽  
A. Zinine ◽  
J. G. M. van Berkum ◽  
M. A. Verheijen ◽  
Z. M. Rittersma ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Gate Dielectrics ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
High K
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