Chemical Vapor Deposition of Epitaxial Silicon‐Germanium from Silane and Germane: I . Kinetics
1995 ◽
Vol 142
(10)
◽
pp. 3513-3520
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Keyword(s):
1995 ◽
Vol 142
(10)
◽
pp. 3520-3527
◽
Keyword(s):
1994 ◽
Vol 33
(Part 1, No.1A)
◽
pp. 240-246
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2000 ◽
Vol 147
(9)
◽
pp. 3541
◽
1988 ◽
Vol 17
(2)
◽
pp. 139-148
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Keyword(s):
1995 ◽
Vol 05
(C5)
◽
pp. C5-261-C5-268
Keyword(s):