Molybdenum contamination in low‐temperature epitaxial silicon films grown by remote plasma chemical vapor deposition

R. Sharma; J. Fretwell; B. Doris; S. Banerjee

doi:10.1063/1.118090

Molybdenum contamination in low‐temperature epitaxial silicon films grown by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.118090 ◽

1996 ◽

Vol 69 (1) ◽

pp. 109-111 ◽

Cited By ~ 3

Author(s):

R. Sharma ◽

J. Fretwell ◽

B. Doris ◽

S. Banerjee

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Epitaxial Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.349732 ◽

1991 ◽

Vol 70 (12) ◽

pp. 7374-7381 ◽

Cited By ~ 94

Author(s):

H. Kakinuma ◽

M. Mohri ◽

M. Sakamoto ◽

T. Tsuruoka

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Structural Properties ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Polycrystalline Silicon Films

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Electric Characterization of Carbon Nanotubes Grown at Low Temperature by Remote Plasma Chemical Vapor Deposition for LSI Interconnects

10.7567/ssdm.2009.e-8-2 ◽

2009 ◽

Author(s):

M. Iizuka ◽

D. Yokoyama ◽

K. Ishimaru ◽

I. Yuitho ◽

T. Takeuchi ◽

...

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Remote-plasma chemical vapor deposition of conformal ZrB2 films at low temperature: A promising diffusion barrier for ultralarge scale integrated electronics

Journal of Applied Physics ◽

10.1063/1.1436296 ◽

2002 ◽

Vol 91 (6) ◽

pp. 3904-3911 ◽

Cited By ~ 63

Author(s):

Junghwan Sung ◽

Dean M. Goedde ◽

Gregory S. Girolami ◽

John R. Abelson

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Integrated Electronics

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Hf/alcohol Preparation of Wafers for the Reduction of Haze in Low Temperature Si Epitaxy by Remote Plasma Chemical Vapor Deposition

MRS Proceedings ◽

10.1557/proc-315-79 ◽

1993 ◽

Vol 315 ◽

Cited By ~ 2

Author(s):

D. Kinosky ◽

R. Qian ◽

A. Mahajan ◽

S. Thomas ◽

P. Munguía ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Low Temperature Si Epitaxy ◽

Si Epitaxy

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Effects of hydrogen on the growth of nanocrystalline silicon films by electron-beam excited plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1287754 ◽

2000 ◽

Vol 88 (11) ◽

pp. 6848-6855 ◽

Cited By ~ 6

Author(s):

Mitsuru Imaizumi ◽

Koji Yamaguchi ◽

Kazuhiko Okitsu ◽

Masafumi Yamaguchi ◽

Tamio Hara ◽

...

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Nanocrystalline Silicon Films

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Low Temperature Heteroepitaxial Growth of 3C-SiC on Silicon Substrates by Triode Plasma Chemical Vapor Deposition using Dimethylsilane

Journal of Applied Sciences ◽

10.3923/jas.2008.3523.3527 ◽

2008 ◽

Vol 8 (19) ◽

pp. 3523-3527 ◽

Cited By ~ 3

Author(s):

A.M. Hashim ◽

K. Yasui

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Substrates ◽

Heteroepitaxial Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth of microcrystal silicon by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.104661 ◽

1991 ◽

Vol 58 (3) ◽

pp. 281-283 ◽

Cited By ~ 25

Author(s):

Sung Chul Kim ◽

Moon Hyun Jung ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590013 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1087 ◽

Cited By ~ 3

Author(s):

M. Hernández Vélez

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Dielectric Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon-Carbon and Silica Films from Organosilicon Sources.

Chemistry of Materials ◽

10.1021/cm012004o ◽

2001 ◽

Vol 13 (8) ◽

pp. 2742-2742 ◽

Cited By ~ 2

Author(s):

A. M. Wróbel ◽

A. Walkiewicz-Pietrzykowska ◽

Y. Hatanaka ◽

S. Wickramanayaka ◽

Y. Nakanishi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Silica Films ◽

Plasma Chemical Vapor Deposition ◽

Silicon Carbon

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Low-Temperature Synthesis of Diamond Films in Thermoassisted RF Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.1428 ◽

1992 ◽

Vol 31 (Part 1, No. 5A) ◽

pp. 1428-1431 ◽

Cited By ~ 13

Author(s):

Ichiro Watanabe ◽

Takashi Matsushita ◽

Koujyu Sasahara

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Rf Plasma ◽

Plasma Chemical ◽

Low Temperature Synthesis ◽

Temperature Synthesis ◽

Plasma Chemical Vapor Deposition

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