Low-Temperature Deposition of Aluminum Oxide on Polyethersulfone Substrate Using Plasma-Enhanced Atomic Layer Deposition

2004 ◽  
Vol 7 (1) ◽  
pp. C13 ◽  
Author(s):  
Sun Jin Yun ◽  
Jung Wook Lim ◽  
Jin-Ho Lee
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Low Temperature Deposition ◽  
Layer Deposition ◽  
Temperature Deposition

scholarly journals Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

2006 ◽  
Vol 153 (11) ◽  
pp. G956 ◽  
Author(s):  
S. B. S. Heil ◽  
E. Langereis ◽  
F. Roozeboom ◽  
M. C. M. van de Sanden ◽  
W. M. M. Kessels
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Deposition ◽  
Layer Deposition ◽  
Temperature Deposition

Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

2015 ◽  
Vol 51 (86) ◽  
pp. 15692-15695 ◽  
Author(s):  
A. Delabie ◽  
M. Caymax ◽  
B. Groven ◽  
M. Heyne ◽  
K. Haesevoets ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Reducing Agents ◽  
Layer Deposition ◽  
Temperature Deposition ◽  
The Impact

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors.

Testing low-temperature atomic layer deposition of aluminum oxide in a 36” chamber

2018 ◽  
Author(s):  
David Fryauf ◽  
Andrew C. Phillips ◽  
Nobuhiko Kobayashi ◽  
Michael J. Bolte ◽  
Aaron Feldman ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Layer Deposition
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