High Quality Fluorinated Silicon Dioxide Films Prepared by Temperature-Difference-Based Liquid-Phase Deposition with Ammonium Hydroxide Incorporation
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2005 ◽
Vol 44
(No. 6)
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pp. L220-L223
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2003 ◽
Vol 107
(46)
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pp. 12700-12704
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1999 ◽
Vol 17
(1)
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pp. 102-107
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1998 ◽
Vol 16
(4)
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pp. 2646-2652
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1998 ◽
Vol 37
(Part 2, No. 1A/B)
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pp. L97-L99
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2001 ◽
Vol 70
(1)
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pp. 78-83
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2007 ◽
Vol 51
(3)
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pp. 1191
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