Effect of a chemical modification on growth silicon dioxide films on gallium arsenide prepared by the liquid phase deposition method

1999 ◽  
Vol 86 (12) ◽  
pp. 7151-7155 ◽  
Author(s):  
C. J. Huang ◽  
M. P. Houng ◽  
Y. H. Wang ◽  
H. H. Wang
Keyword(s):  
Gallium Arsenide ◽  
Liquid Phase ◽  
Chemical Modification ◽  
Silicon Dioxide ◽  
Liquid Phase Deposition ◽  
Deposition Method ◽  
Silicon Dioxide Films

Characterization of Thermally Annealed Fluorinated Silicon Dioxide Films Prepared by Liquid-Phase Deposition

2005 ◽  
Vol 44 (No. 6) ◽  
pp. L220-L223 ◽  
Author(s):  
Ming-Kwei Lee ◽  
Chung-Min Shih ◽  
Shu-Ming Chang ◽  
Hong-Chi Wang ◽  
Jung-Jie Huang
Keyword(s):  
Liquid Phase ◽  
Silicon Dioxide ◽  
Liquid Phase Deposition ◽  
Silicon Dioxide Films

Improved formation of silicon dioxide films in liquid phase deposition

1998 ◽  
Vol 16 (4) ◽  
pp. 2646-2652 ◽  
Author(s):  
C. J. Huang ◽  
M. P. Houng ◽  
Y. H. Wang ◽  
N. F. Wang ◽  
Jiann-Ruey Chen
Keyword(s):  
Liquid Phase ◽  
Silicon Dioxide ◽  
Liquid Phase Deposition ◽  
Silicon Dioxide Films

Liquid-Phase Deposition of Silicon-Dioxide Films using Tetra-Ethyl Orthosilicate

1998 ◽  
Vol 37 (Part 2, No. 1A/B) ◽  
pp. L97-L99 ◽  
Author(s):  
Koh-ichi Usami ◽  
Shin Hayashi ◽  
Yasutaka Uchida ◽  
Masakiyo Matsumura
Keyword(s):  
Liquid Phase ◽  
Silicon Dioxide ◽  
Liquid Phase Deposition ◽  
Silicon Dioxide Films ◽  
Tetra Ethyl Orthosilicate
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