In Situ Fourier Transform Infrared Spectroscopy near the Substrate in Tetraethoxysilane/Ozone Chemical Vapor Deposition

1999 ◽  
Vol 2 (10) ◽  
pp. 527 ◽  
Author(s):  
Thomas K. Whidden
1995 ◽  
Vol 403 ◽  
Author(s):  
Tue Nguyen ◽  
Shusheng He ◽  
Lawrence J. Charnesky

AbstractSelective deposition of copper on metal (such as TiN) versus dielectric (such as oxide) requires understanding of the mechanism of chemical-vapor-deposition copper deposition. This work studies the initial stage of CVD copper deposition with hexafluoroacetylacetonate Cu(I) trimethylvinylsilane (Cu-hfac-tmvs) precursor on tetraethylorthosilicate (TEOS) oxide using Fourier transform infrared spectroscopy (FTIR).


2021 ◽  
Vol 11 (6) ◽  
pp. 2021-2025
Author(s):  
Liujin Wei ◽  
Guan Huang ◽  
Yajun Zhang

The combination of time-resolved transient photoluminescence with in-situ Fourier transform infrared spectroscopy has been conducted to investigate the intrinsic phase structure-dependent activity of Bi2O3 catalyst for CO2 reduction.


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