Structure and Electrical Properties of Sputter Deposited (Ba[sub 1−x],Sr[sub x])(Ti[sub 1−y],Zr[sub y])O[sub 3] Thin Films

2001 ◽  
Vol 148 (8) ◽  
pp. F155 ◽  
Author(s):  
Sang-Shik Park ◽  
Soon-Gil Yoon
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Sputter Deposited

Studies of MZS and MZOS Structures with Zinc Oxide Deposited by Conventional Rf Diode and Magnetron Sputtering Techniques

1986 ◽  
Vol 77 ◽  
Author(s):  
S. N. Venkatesh ◽  
E. S. Ramakrishnan ◽  
K. C. Jungling ◽  
S. B. Krupanidhi
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Comparative Evaluation ◽  
Growth Process ◽  
Zno Films ◽  
Electrical Characteristics ◽  
Ceramic Target ◽  
Sputter Deposited

ABSTRACTHighly crystalline and c-axis oriented zinc oxide thin films were sputter deposited from a ceramic target using rf diode and magnetron sputtering techniques. A comparative evaluation of structure and electrical characteristics of ZnO films in the MZS and MZOS configurations is presented and the results are discussed. The physical and electrical properties were significantly influenced by highly energetic particles originating from the presence of oxygen neutrals in the plasma during the growth process and the behavior differed between the diode and magnetron sputtering processes.

On the electrical properties of sputter deposited thin films: The role of energy and impurity flux

2019 ◽  
Vol 690 ◽  
pp. 137540 ◽  
Author(s):  
Florian G. Cougnon ◽  
Isabella C. Schramm ◽  
Diederik Depla
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Sputter Deposited

Microstructure — Electrical properties relationship of YSZ thin films reactively sputter-deposited at different pressures

Ionics ◽  
2005 ◽  
Vol 11 (3-4) ◽  
pp. 301-305 ◽  
Author(s):  
P. Briois ◽  
E. Gourba ◽  
A. Billard ◽  
A. Ringuedé ◽  
M. Cassir
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Sputter Deposited ◽  
Relationship Of
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