Ion energy, ion flux, and ion species effects on crystallographic and electrical properties of sputter-deposited Ta thin films

1997 ◽  
Vol 15 (5) ◽  
pp. 2627-2635 ◽  
Author(s):  
Kazuhide Ino ◽  
Toshikuni Shinohara ◽  
Takeo Ushiki ◽  
Tadahiro Ohmi
1986 ◽  
Vol 77 ◽  
Author(s):  
S. N. Venkatesh ◽  
E. S. Ramakrishnan ◽  
K. C. Jungling ◽  
S. B. Krupanidhi

ABSTRACTHighly crystalline and c-axis oriented zinc oxide thin films were sputter deposited from a ceramic target using rf diode and magnetron sputtering techniques. A comparative evaluation of structure and electrical characteristics of ZnO films in the MZS and MZOS configurations is presented and the results are discussed. The physical and electrical properties were significantly influenced by highly energetic particles originating from the presence of oxygen neutrals in the plasma during the growth process and the behavior differed between the diode and magnetron sputtering processes.


2019 ◽  
Vol 690 ◽  
pp. 137540 ◽  
Author(s):  
Florian G. Cougnon ◽  
Isabella C. Schramm ◽  
Diederik Depla

Ionics ◽  
2005 ◽  
Vol 11 (3-4) ◽  
pp. 301-305 ◽  
Author(s):  
P. Briois ◽  
E. Gourba ◽  
A. Billard ◽  
A. Ringuedé ◽  
M. Cassir

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