Microstructure — Electrical properties relationship of YSZ thin films reactively sputter-deposited at different pressures

Ionics ◽  
2005 ◽  
Vol 11 (3-4) ◽  
pp. 301-305 ◽  
Author(s):  
P. Briois ◽  
E. Gourba ◽  
A. Billard ◽  
A. Ringuedé ◽  
M. Cassir
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Sputter Deposited ◽  
Relationship Of

Characterization of Cu2O Thin Film Grown by Molecular Beam Epitaxy

2013 ◽  
Vol 582 ◽  
pp. 157-160 ◽  
Author(s):  
Takumi Oshima ◽  
Masaya Nohara ◽  
Takuya Hoshina ◽  
Hiroaki Takeda ◽  
Takaaki Tsurumi
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Properties ◽  
Molecular Beam Epitaxy ◽  
Deposition Rate ◽  
Crystal Orientation ◽  
Molecular Beam ◽  
Good Crystallinity ◽  
Relationship Of

We report the growth of Cu2O thin films on glass and MgO(100) substrates by molecular beam epitaxy. Crystal orientation of Cu2O thin films on glass substrate were changed from (100) to (111) with increasing the deposition rate. The Cu2O thin films were epitaxially grown on MgO(100) substrate with an orientation relationship of Cu2O(110) // MgO(100). The film quality and electrical properties of Cu2O thin films were changed with deposition rate. The slow deposition rate resulted in high conductivity and mobility, as well as good crystallinity and orientation.

Studies of MZS and MZOS Structures with Zinc Oxide Deposited by Conventional Rf Diode and Magnetron Sputtering Techniques

1986 ◽  
Vol 77 ◽  
Author(s):  
S. N. Venkatesh ◽  
E. S. Ramakrishnan ◽  
K. C. Jungling ◽  
S. B. Krupanidhi
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Comparative Evaluation ◽  
Growth Process ◽  
Zno Films ◽  
Electrical Characteristics ◽  
Ceramic Target ◽  
Sputter Deposited

ABSTRACTHighly crystalline and c-axis oriented zinc oxide thin films were sputter deposited from a ceramic target using rf diode and magnetron sputtering techniques. A comparative evaluation of structure and electrical characteristics of ZnO films in the MZS and MZOS configurations is presented and the results are discussed. The physical and electrical properties were significantly influenced by highly energetic particles originating from the presence of oxygen neutrals in the plasma during the growth process and the behavior differed between the diode and magnetron sputtering processes.

On the electrical properties of sputter deposited thin films: The role of energy and impurity flux

2019 ◽  
Vol 690 ◽  
pp. 137540 ◽  
Author(s):  
Florian G. Cougnon ◽  
Isabella C. Schramm ◽  
Diederik Depla
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Sputter Deposited
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