Electron Optics of an Electron-Beam Lithographic System

Research into the properties of cathode rays started in the 1850's when Geissler found out how to make vacuum tight gas-metal seals. It was soon discovered how to deflect the beam and concentrate it into a relatively small spot by means of a long magnetic solenoid, the theory of which was well established. Gabor's short concentrating coil complete with iron outer-shroud, shown in Fig 1., was introduced into a high voltage oscillograph in the period 1924-1926. It worked well but did not fit into the classical theoretical framework. The correct explanation of the action of a short coil in focussing an electron beam and its analogy with the focussing effect of the “burning glass” was first given by Hans Busoh in 1926. Busch left several questions open concerning the optical analogy and in 1928 Max Knoll and his student Ernst Ruska began in Berlin the first systematic investigation in “electron-optics”, with the aid of the electron-optical bench shown in Fig 2.

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Electron optics for high throughput electron beam lithography system

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585630 ◽

1991 ◽

Vol 9 (6) ◽

pp. 2940 ◽

Cited By ~ 6

Author(s):

Yasunari Sohda

Keyword(s):

Electron Beam ◽

High Throughput ◽

Electron Beam Lithography ◽

Electron Optics ◽

Lithography System

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Simulation analysis of a miniaturized electron optics of the massively parallel electron-beam direct-write (MPEBDW) for multi-column system

10.1117/12.2257967 ◽

2017 ◽

Author(s):

Akira Kojima ◽

Naokatsu Ikegami ◽

Hiroshi Miyaguchi ◽

Takashi Yoshida ◽

Ryutaro Suda ◽

...

Keyword(s):

Electron Beam ◽

Simulation Analysis ◽

Massively Parallel ◽

Electron Optics ◽

Direct Write ◽

Column System

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A high-speed, high-precision electron beam lithography system (electron optics)

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583300 ◽

1985 ◽

Vol 3 (1) ◽

pp. 98 ◽

Cited By ~ 3

Author(s):

N. Saitou

Keyword(s):

Electron Beam ◽

High Precision ◽

Electron Beam Lithography ◽

High Speed ◽

Electron Optics ◽

Lithography System

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Imaging simulation of charged nanowires in TEM with large defocus distance

Microscopy ◽

10.1093/jmicro/dfab008 ◽

2021 ◽

Author(s):

Te Shi ◽

Shikai Liu ◽

H Tian ◽

Z J Ding

Keyword(s):

Electron Beam ◽

Charge Distribution ◽

Complete Solution ◽

Bayesian Optimization ◽

Electron Optics ◽

Verification Method ◽

Transmission Electron ◽

Imaging Simulation ◽

Phase Map ◽

Good Agreement

Abstract In transmission electron microscope (TEM), both the amplitude and the phase of electron beam change when electrons traverse a specimen. The amplitude is easily obtained by the square root of the intensity of a TEM image, while the phase affects defocused images. In order to obtain the phase map and verify the theoretical model of the interaction between electron beam and specimen, a lot of simulations have to be performed by researchers. In this work, we have simulated defocus images of a SiC nanowire in TEM with the method of electron optics. Mean inner potential and charge distribution on the nanowire have been considered in the simulation. Besides, due to electron scattering, coherence loss of the electron beam has been introduced. A dynamic process with Bayesian optimization was used in the simulation. With the infocus image as input and by adjusting fitting parameters, the defocus image is determined with a reasonable charge distribution. The calculated defocus images are in a good agreement with the experimental ones. Here, we present a complete solution and verification method for solving nanoscale charge distribution in TEM.

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