Al/AlN/InP Metal-Insulator-Semiconductor-Diode Characteristics with Amorphous AlN Films Deposited by Electron-Cyclotron-Resonance Sputtering
2005 ◽
Vol 44
(1A)
◽
pp. 334-342
◽
1995 ◽
Vol 13
(5)
◽
pp. 2013
◽
2006 ◽
Vol 45
(9B)
◽
pp. 7345-7350
◽
1984 ◽
Vol 45
(C1)
◽
pp. C1-961-C1-963
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