Al/AlN/InP Metal-Insulator-Semiconductor-Diode Characteristics with Amorphous AlN Films Deposited by Electron-Cyclotron-Resonance Sputtering

2005 ◽  
Vol 44 (1A) ◽  
pp. 334-342 ◽  
Author(s):  
Kunio Saito ◽  
Toshiro Ono ◽  
Masaru Shimada ◽  
Naoteru Shigekawa ◽  
Takatomo Enoki
1994 ◽  
Vol 30 (1) ◽  
pp. 84-85 ◽  
Author(s):  
R.J. Shul ◽  
D.J. Rieger ◽  
C. Constantine ◽  
A.G. Baca ◽  
C. Barratt

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