scholarly journals Good quality Al/SiNx:H/InP metal-insulator-semiconductor devices obtained with electron cyclotron resonance plasma method

1998 ◽  
Vol 83 (1) ◽  
pp. 600-603 ◽  
Author(s):  
S. Garcia ◽  
I. Mártil ◽  
G. Gonzalez Diaz ◽  
E. Castan ◽  
S. Dueñas ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Semiconductor Devices ◽  
Electron Cyclotron ◽  
Metal Insulator ◽  
Electron Cyclotron Resonance Plasma ◽  
Metal Insulator Semiconductor ◽  
Plasma Method ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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