Structure and Electrical Properties of Titanium Nitride Films

Yasuhiro Igasaki; Hiroji Mitsuhashi; Koichi Azuma; Tokio Muto

doi:10.1143/jjap.17.85

Structure and Electrical Properties of Titanium Nitride Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.17.85 ◽

1978 ◽

Vol 17 (1) ◽

pp. 85-96 ◽

Cited By ~ 47

Author(s):

Yasuhiro Igasaki ◽

Hiroji Mitsuhashi ◽

Koichi Azuma ◽

Tokio Muto

Keyword(s):

Electrical Properties ◽

Titanium Nitride

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The effect of thermal treatment on the electrical properties of titanium nitride thin films by filtered arc plasma method

Ceramics International ◽

10.1016/j.ceramint.2003.12.042 ◽

2004 ◽

Vol 30 (7) ◽

pp. 1921-1924 ◽

Cited By ~ 22

Author(s):

J.M. Wang ◽

W.G. Liu ◽

T. Mei

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Thermal Treatment ◽

Titanium Nitride ◽

Arc Plasma ◽

Plasma Method

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Sputter-etching and plasma effects on the electrical properties of titanium nitride contacts on n-type silicon

Solid-State Electronics ◽

10.1016/0038-1101(90)90113-s ◽

1990 ◽

Vol 33 (11) ◽

pp. 1387-1391 ◽

Cited By ~ 3

Author(s):

S.S. Ang ◽

H.M. Le ◽

W.D. Brown

Keyword(s):

Electrical Properties ◽

Titanium Nitride ◽

Type Silicon ◽

Plasma Effects ◽

Sputter Etching

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In vitro electrical properties for iridium oxide versus titanium nitride stimulating electrodes

IEEE Transactions on Biomedical Engineering ◽

10.1109/tbme.2002.805487 ◽

2002 ◽

Vol 49 (12) ◽

pp. 1574-1579 ◽

Cited By ~ 250

Author(s):

J.D. Weiland ◽

D.J. Anderson ◽

M.S. Humayun

Keyword(s):

Electrical Properties ◽

Titanium Nitride ◽

Iridium Oxide ◽

Stimulating Electrodes

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Electrical Properties of DC Sputtered Titanium Nitride Films with Different Processing Conditions and Substrates

Journal of the Korean Ceramic Society ◽

10.4191/kcers.2005.42.7.455 ◽

2005 ◽

Vol 42 (7) ◽

pp. 455-460 ◽

Cited By ~ 3

Keyword(s):

Electrical Properties ◽

Titanium Nitride ◽

Processing Conditions

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Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering

ElectroComponent Science and Technology ◽

10.1155/apec.8.249 ◽

1981 ◽

Vol 8 (3-4) ◽

pp. 249-249 ◽

Cited By ~ 5

Author(s):

K. Kawabata ◽

T. Muto

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Titanium Nitride ◽

Reactive Sputtering

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Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0000028 ◽

2020 ◽

Vol 38 (3) ◽

pp. 032403 ◽

Cited By ~ 3

Author(s):

Igor Krylov ◽

Yuanshen Qi ◽

Valentina Korchnoy ◽

Kamira Weinfeld ◽

Moshe Eizenberg ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Titanium Nitride ◽

Atomic Layer ◽

Low Pressure ◽

Pressure Plasma ◽

Layer Deposition ◽

Low Pressure Plasma

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Corrosion resistance and electrical properties of carbon/chromium–titanium–nitride multilayer coatings on stainless steel

Journal of Power Sources ◽

10.1016/j.jpowsour.2013.10.103 ◽

2014 ◽

Vol 249 ◽

pp. 299-305 ◽

Cited By ~ 21

Author(s):

Kai Feng ◽

Zhuguo Li ◽

Fenggui Lu ◽

Jian Huang ◽

Xun Cai ◽

...

Keyword(s):

Stainless Steel ◽

Corrosion Resistance ◽

Electrical Properties ◽

Titanium Nitride ◽

Multilayer Coatings

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Study on structural, morphological and electrical properties of sputtered titanium nitride films under different argon gas flow

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2012.03.078 ◽

2012 ◽

Vol 134 (2-3) ◽

pp. 839-844 ◽

Cited By ~ 28

Author(s):

Nishat Arshi ◽

Junqing Lu ◽

Yun Kon Joo ◽

Chan Gyu Lee ◽

Jae Hong Yoon ◽

...

Keyword(s):

Electrical Properties ◽

Titanium Nitride ◽

Gas Flow ◽

Argon Gas

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The effect of annealing on the structural, optical and electrical properties of Titanium Nitride (TiN) thin films prepared by DC magnetron sputtering with supported discharge

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-016-5130-0 ◽

2016 ◽

Vol 27 (10) ◽

pp. 10427-10434 ◽

Cited By ~ 4

Author(s):

A. Kavitha ◽

R. Kannan ◽

P. Sreedhara Reddy ◽

S. Rajashabala

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Optical And Electrical Properties ◽

Dc Magnetron Sputtering ◽

Tin Thin Films

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Effects of Nitrogen Concentration on Structural and Electrical Properties of Titanium Nitride for Thin-Film Resistor Applications

Electrochemical and Solid-State Letters ◽

10.1149/1.2216592 ◽

2006 ◽

Vol 9 (9) ◽

pp. G279 ◽

Cited By ~ 8

Author(s):

Nguyen Duy Cuong ◽

Dong-Jin Kim ◽

Byoung-Don Kang ◽

Soon-Gil Yoon

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Titanium Nitride ◽

Nitrogen Concentration ◽

Film Resistor ◽

Thin Film Resistor ◽

Structural And Electrical Properties

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