Corrosion Protection Of Front Surface Aluminum Mirror Coatings With Dielectric Thin Films Deposited By Reactive Ion Plating

1990 ◽  
Author(s):  
Karl H. Guenther ◽  
lain Penny ◽  
Ron Willey
Keyword(s):  
Thin Films ◽  
Corrosion Protection ◽  
Front Surface ◽  
Dielectric Thin Films ◽  
Ion Plating ◽  
Aluminum Mirror

scholarly journals Mechanical Properties of Optical Dielectric Thin Films Deposited by the Ion Plating Technique

1997 ◽  
Vol 8 (4-5) ◽  
pp. 251-260 ◽  
Author(s):  
Christine Mahodaux ◽  
Hervé Rigneault ◽  
Hugues Giovannini ◽  
Ludovic Escoubas ◽  
Paul Morreti
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Dielectric Thin Films ◽  
Ion Plating ◽  
Plating Technique ◽  
Optical Dielectric

Overview about the optical properties and mechanical stress of different dielectric thin films produced by reactive-low-voltage-ion-plating

2008 ◽  
Vol 516 (14) ◽  
pp. 4587-4592 ◽  
Author(s):  
A. Hallbauer ◽  
D. Huber ◽  
G.N. Strauss ◽  
S. Schlichtherle ◽  
A. Kunz ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Mechanical Stress ◽  
Low Voltage ◽  
Dielectric Thin Films ◽  
Ion Plating

Finite-Element Modeling and Quantitative Measurement Using Scanning Microwave Microscopy to Characterize Dielectric Films

2018 ◽  
Author(s):  
K. A. Rubin ◽  
W. Jolley ◽  
Y. Yang
Keyword(s):  
Thin Films ◽  
Dielectric Film ◽  
Dielectric Constants ◽  
Dielectric Films ◽  
Silicon Substrates ◽  
Fem Modeling ◽  
Dielectric Thin Films ◽  
Microwave Microscopy ◽  
Scanning Microwave Microscopy ◽  
Low K

Abstract Scanning Microwave Impedance Microscopy (sMIM) can be used to characterize dielectric thin films and to quantitatively discern film thickness differences. FEM modeling of the sMIM response provides understanding of how to connect the measured sMIM signals to the underlying properties of the dielectric film and its substrate. Modeling shows that sMIM can be used to characterize a range of dielectric film thicknesses spanning both low-k and medium-k dielectric constants. A model system consisting of SiO2 thin films of various thickness on silicon substrates is used to illustrate the technique experimentally.

Tunable microwave mixing in nonlinear dielectric thin films of SrTiO3 and Sr0.5Ba0.5TiO3

1995 ◽  
Vol 31 (21) ◽  
pp. 1814-1815 ◽  
Author(s):  
A.T. Findikoglu ◽  
D.W. Reagor ◽  
Q.X. Jia ◽  
X.D. Wu
Keyword(s):  
Thin Films ◽  
Dielectric Thin Films ◽  
Nonlinear Dielectric ◽  
Tunable Microwave

Study on Arc Ion Plating Nitride Films of Microscopic Morphology and Micro-Hardness

2011 ◽  
Vol 306-307 ◽  
pp. 274-279
Author(s):  
Qing Tao ◽  
Yan Wei Sui ◽  
Sun Zhi ◽  
Wei Song
Keyword(s):  
Thin Films ◽  
Steel Substrate ◽  
Nitride Film ◽  
Composition Analysis ◽  
Micro Hardness ◽  
Arc Ion Plating ◽  
Ion Plating ◽  
Tin Thin Films ◽  
Research Procedure ◽  
Microscopic Morphology

AlN and TiN thin films are widely used in electronic devices and acoustic material and other fields because of its unique merit, the preparation of nitride thin films by using the arc ion plating has not been a systematic and deep study. The article presents our research procedure which the AlN and TiN thin films are deposited on stainless steel substrate by arc ion plating (AIP). The characteristics of thin films, for example microstructure, morphology, composition analysis and hardness, are examined and analyzed. The results showed that: Droplet-like particles appear in the microstructure of nitride thin films, and the grain size of droplet-like particles in AlN thin films is greater than in TiN thin films. The micro-hardness of nitride films preparation in experiment has improved significantly, and establish firmly basic for extending the application field of nitride film.

Sol-gel derived TiNb2 O7 dielectric thin films for transparent electronic applications

2017 ◽  
Vol 101 (2) ◽  
pp. 674-682 ◽  
Author(s):  
Ming-Chuan Chang ◽  
Chieh-Szu Huang ◽  
Yi-Da Ho ◽  
Cheng-Liang Huang
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Dielectric Thin Films

Laser evaporation deposition of superconducting and dielectric thin films

1988 ◽  
Vol 52 (21) ◽  
pp. 1825-1827 ◽  
Author(s):  
H. S. Kwok ◽  
P. Mattocks ◽  
L. Shi ◽  
X. W. Wang ◽  
S. Witanachchi ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Evaporation ◽  
Dielectric Thin Films
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