Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process

2009 ◽  
Author(s):  
Shinji Tarutani ◽  
Tsubaki Hideaki ◽  
Sou Kamimura
Keyword(s):  
Double Patterning ◽  
Negative Tone ◽  
193 Nm

scholarly journals Negative-tone cycloolefin photoresist for 193-nm lithography

2001 ◽  
Author(s):  
ShihChi Fu ◽  
Kuo-Huang Hsieh ◽  
Lon A. Wang
Keyword(s):  
Negative Tone ◽  
193 Nm

scholarly journals Materials and Processes of Negative Tone Development for Double Patterning Process

2009 ◽  
Vol 22 (5) ◽  
pp. 635-640 ◽  
Author(s):  
Shinji Tarutani ◽  
Hideaki Tsubaki ◽  
Sou Kamimura
Keyword(s):  
Double Patterning ◽  
Negative Tone

Study of bilayer negative-tone silylation process for 193-nm lithography

2000 ◽  
Author(s):  
Hiroyuki Watanabe ◽  
Isao Satou ◽  
Masayuki Endo ◽  
Hiroaki Morimoto
Keyword(s):  
Negative Tone ◽  
193 Nm

Negative tone 193-nm photoresists

2003 ◽  
Author(s):  
Nick Pugliano ◽  
Patrick J. Bolton ◽  
Tony Barbieri ◽  
Matt King ◽  
Michael T. Reilly ◽  
...  
Keyword(s):  
Negative Tone ◽  
193 Nm

Negative-tone 193-nm resists

2000 ◽  
Author(s):  
Sungseo Cho ◽  
Anthony Vander Heyden ◽  
Jeff D. Byers ◽  
C. Grant Willson
Keyword(s):  
Negative Tone ◽  
193 Nm

Positive and negative tone double patterning lithography for 50nm flash memory

2006 ◽  
Author(s):  
Chang-Moon Lim ◽  
Seo-Min Kim ◽  
Young-Sun Hwang ◽  
Jae-Seung Choi ◽  
Keun-Do Ban ◽  
...  
Keyword(s):  
Flash Memory ◽  
Double Patterning ◽  
Negative Tone

Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

1999 ◽  
Author(s):  
Olivier P. Joubert ◽  
D. Fuard ◽  
Cedric Monget ◽  
Patrick Schiavone ◽  
Olivier Toublan ◽  
...  
Keyword(s):  
Process Optimization ◽  
Negative Tone ◽  
193 Nm
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