High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches
2016 ◽
Vol 233
(2)
◽
pp. 209-238
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2019 ◽
Vol 105
(1)
◽
pp. E440
Keyword(s):
2006 ◽
Keyword(s):
2008 ◽