Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ = 193nm

2007 ◽  
Author(s):  
Gianfranco Capetti ◽  
Pietro Cantù ◽  
Elisa Galassini ◽  
Alessandro Vaglio Pret ◽  
Catia Turco ◽  
...  
Keyword(s):  
Flash Memory ◽  
Memory Devices ◽  
Technology Node ◽  
Patterning Technique ◽  
Double Patterning

Combined mask and illumination scheme optimization for robust contact patterning on 45nm technology node flash memory devices

2008 ◽  
Author(s):  
Alessandro Vaglio Pret ◽  
Gianfranco Capetti ◽  
Maddalena Bollin ◽  
Gina Cotti ◽  
Danilo De Simone ◽  
...  
Keyword(s):  
Flash Memory ◽  
Memory Devices ◽  
Technology Node ◽  
Scheme Optimization

Adaptive Interference Mitigation for Multilevel Flash Memory Devices

2011 ◽  
Vol E94-A (11) ◽  
pp. 2453-2457
Author(s):  
Myeongwoon JEON ◽  
Kyungchul KIM ◽  
Sungkyu CHUNG ◽  
Seungjae CHUNG ◽  
Beomju SHIN ◽  
...  
Keyword(s):  
Flash Memory ◽  
Interference Mitigation ◽  
Memory Devices

Characterization of tunnel-oxide degradation due to plasma field oxide recess in flash memory devices

2012 ◽  
Vol 520 (15) ◽  
pp. 5007-5010 ◽  
Author(s):  
Jeungyun Lee ◽  
Dong-Kwon Kim ◽  
Gyung-Jin Min ◽  
Ilsub Chung
Keyword(s):  
Flash Memory ◽  
Memory Devices ◽  
Oxide Degradation ◽  
Field Oxide

Garbage Collection Algorithms for NAND Flash Memory Devices -- An Overview

2013 ◽  
Author(s):  
Raja Subramani ◽  
Haritima Swapnil ◽  
Niharika Thakur ◽  
Bharath Radhakrishnan ◽  
Krishnamurthy Puttaiah
Keyword(s):  
Flash Memory ◽  
Garbage Collection ◽  
Memory Devices ◽  
Nand Flash ◽  
Nand Flash Memory

Excellent Emission Characteristics of Tunneling Oxides Formed Using Ultrathin Silicon Films for Flash Memory Devices

1996 ◽  
Vol 35 (Part 1, No. 6A) ◽  
pp. 3369-3373 ◽  
Author(s):  
Ping-Wei Wang ◽  
Tzu-Kun Ku ◽  
Huan-Ping Su ◽  
Gary Hong ◽  
Huang-Chung Cheng
Keyword(s):  
Flash Memory ◽  
Silicon Films ◽  
Emission Characteristics ◽  
Memory Devices
Sign in / Sign up

Export Citation Format

Share Document