Extending immersion lithography with high-index materials: results of a feasibility study

2007 ◽  
Author(s):  
Harry Sewell ◽  
Jan Mulkens ◽  
Paul Graeupner ◽  
Diane McCafferty ◽  
Louis Markoya ◽  
...  
Keyword(s):  
Feasibility Study ◽  
High Index ◽  
Immersion Lithography

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

2007 ◽  
Author(s):  
Yoshiyuki Sekine ◽  
Miyoko Kawashima ◽  
Eiji Sakamoto ◽  
Keita Sakai ◽  
Akihiro Yamada ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography

scholarly journals Novel high-index resists for 193-nm immersion lithography and beyond

2007 ◽  
Author(s):  
Idriss Blakey ◽  
Lan Chen ◽  
Bronwin Dargaville ◽  
Heping Liu ◽  
Andrew Whittaker ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

Feasibility study of immersion system using high-index materials

2007 ◽  
Author(s):  
K. Sakai ◽  
Y Iwasaki ◽  
S. Mori ◽  
A. Yamada ◽  
K. Yamashita ◽  
...  
Keyword(s):  
Feasibility Study ◽  
High Index

Current status of high-index immersion lithography development

2007 ◽  
Author(s):  
Yasuhiro Ohmura ◽  
Toshiharu Nakashima ◽  
Hiroyuki Nagasaka ◽  
Ayako Sukegawa ◽  
Satoshi Ishiyama ◽  
...  
Keyword(s):  
High Index ◽  
Current Status ◽  
Immersion Lithography

New high-index fluids for immersion lithography

2006 ◽  
Author(s):  
Elizabeth Costner ◽  
J. Christopher Taylor ◽  
Stefan Caporale ◽  
William Wojtczak ◽  
Dean Dewulf ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography

High-index resist for 193-nm immersion lithography

2008 ◽  
Author(s):  
Kazuya Matsumoto ◽  
Elizabeth Costner ◽  
Isao Nishimura ◽  
Mitsuru Ueda ◽  
C. Grant Willson
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

Feasibility Study on Immersion System Using High-Index Materials

2008 ◽  
Vol 47 (6) ◽  
pp. 4853-4861 ◽  
Author(s):  
Keita Sakai ◽  
Yuichi Iwasaki ◽  
Sunao Mori ◽  
Akihiro Yamada ◽  
Makoto Ogusu ◽  
...  
Keyword(s):  
Feasibility Study ◽  
High Index

Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

2005 ◽  
Author(s):  
Tsukasa Hori ◽  
Takayuki Yabu ◽  
Takanobu Ishihara ◽  
Takayuki Watanabe ◽  
Osamu Wakabayashi ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Feasibility Study ◽  
Immersion Lithography ◽  
Arf Excimer Laser ◽  
193 Nm

New high-index fluids: exploiting anomalous dispersion for immersion lithography

2008 ◽  
Author(s):  
Elizabeth A. Costner ◽  
Kazuya Matsumoto ◽  
Brian K. Long ◽  
J. Christopher Taylor ◽  
William Wojtczak ◽  
...  
Keyword(s):  
Anomalous Dispersion ◽  
High Index ◽  
Immersion Lithography

High-index immersion lithography: preventing lens photocontamination and identifying optical behavior of LuAG

2008 ◽  
Author(s):  
V. Liberman ◽  
M. Rothschild ◽  
S. T. Palmacci ◽  
R. Bristol ◽  
J. Byers ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
Optical Behavior
Sign in / Sign up

Export Citation Format

Share Document