Aerial-image modeling for the extreme ultraviolet microfield exposure tool at SEMATECH North

2006 ◽  
Author(s):  
Patrick Naulleau ◽  
Kim Dean ◽  
Klaus Lowack
Keyword(s):  
Extreme Ultraviolet ◽  
Aerial Image ◽  
Image Modeling

Aerial image characterization for the defects in the extreme ultraviolet mask

2004 ◽  
Author(s):  
Myoung-Sul Yoo ◽  
Seung-Wook Park ◽  
Jong-Hoi Kim ◽  
Yeong-Keun Kwon ◽  
Hye-Keun Oh
Keyword(s):  
Extreme Ultraviolet ◽  
Aerial Image

Analysis of partially coherent light propagation through the soft X-ray interference lithography beamline at SSRF

2021 ◽  
Vol 28 (3) ◽  
pp. 902-909
Author(s):  
Xiangyu Meng ◽  
Huaina Yu ◽  
Yong Wang ◽  
Junchao Ren ◽  
Chaofan Xue ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Extreme Ultraviolet ◽  
Aerial Images ◽  
Aerial Image ◽  
Photon Flux ◽  
Coherent Light ◽  
Fringe Visibility ◽  
X Ray ◽  
Partially Coherent ◽  
Partially Coherent Light

The mutual optical intensity (MOI) model is extended to the simulation of the interference pattern produced by extreme ultraviolet lithography with partially coherent light. The partially coherent X-ray propagation through the BL08U1B beamline at Shanghai Synchrotron Radiation Facility is analysed using the MOI model and SRW (Synchrotron Radiation Workshop) method. The fringe intensity at the exposure area is not uniform but has similar envelope lines to Fresnel diffraction, which is explained by the diffraction from the finite grating modelled as a single aperture. By balancing the slit size and photon stop size, the fringe visibility, photon flux and intensity slope can be optimized. Further analysis shows that the effect of pink light on the aerial images is negligible, whereas the third-harmonic light should be considered to obtain a balance between high fringe visibility and high flux. Two grating interference exposure experiments were performed in the BL08U1B beamline. The aerial image depth showed that the polymethyl methacrylate photoresist depth was determined by the X-ray coherence properties.

Measurement of mid-spatial-frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements

1997 ◽  
Author(s):  
Charles H. Fields ◽  
Avijit K. Ray-Chaudhuri ◽  
Kevin D. Krenz ◽  
William G. Oldham ◽  
Richard H. Stulen
Keyword(s):  
Spatial Frequency ◽  
Extreme Ultraviolet ◽  
Aerial Image ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

АЗРАБОТКА И ПРИМЕНЕНИЕ ЭКСПРЕСС-МЕТОДА ДЛЯ УВЕЛИЧЕНИЯ ОКНА ЛИТОГРАФИЧЕСКОГО ПРОЦЕССА

2020 ◽  
Vol 96 (3s) ◽  
pp. 730-732
Author(s):  
Е.Л. Харченко ◽  
Е.С. Шамин ◽  
А.В. Кузовков ◽  
В.В. Иванов
Keyword(s):  
Aerial Image ◽  
Process Window ◽  
Image Modeling ◽  
Cad Systems

В данной работе приведены основы моделирования воздушного изображения, существующие методики и САПР для расстановки SRAF. На их основе разработан метод оценки правил расстановки вспомогательных непечатаемых структур. С помощью этого метода проведено исследование зависимости окна литографического процесса от правил расстановки вспомогательных структур, прописанных в рецепте. This paper presents the basics of aerial image modeling, existing techniques, and CAD systems for the placement of SRAF. Based on them, a method has been developed for evaluating the rules for the placement of sub-resolution assist features. Using this method, a study has been conducted on the dependence of the lithographic process window on the placement rules for the sub-resolution assist features prescribed in the recipe.

Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

2007 ◽  
Vol 46 (9B) ◽  
pp. 6113-6117 ◽  
Author(s):  
Hiroo Kinoshita ◽  
Kazuhiro Hamamoto ◽  
Nobuyuki Sakaya ◽  
Morio Hosoya ◽  
Takeo Watanabe
Keyword(s):  
Extreme Ultraviolet ◽  
Aerial Image ◽  
Inspection System ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Mask Inspection ◽  
Image Mask
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