Measurement of mid-spatial-frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements

1997 ◽  
Author(s):  
Charles H. Fields ◽  
Avijit K. Ray-Chaudhuri ◽  
Kevin D. Krenz ◽  
William G. Oldham ◽  
Richard H. Stulen
Keyword(s):  
Spatial Frequency ◽  
Extreme Ultraviolet ◽  
Aerial Image ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

2007 ◽  
Vol 46 (9B) ◽  
pp. 6113-6117 ◽  
Author(s):  
Hiroo Kinoshita ◽  
Kazuhiro Hamamoto ◽  
Nobuyuki Sakaya ◽  
Morio Hosoya ◽  
Takeo Watanabe
Keyword(s):  
Extreme Ultraviolet ◽  
Aerial Image ◽  
Inspection System ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Mask Inspection ◽  
Image Mask

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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