Full-field exposure control implications of the mask error function

2006 ◽  
Author(s):  
Terrence E. Zavecz
Keyword(s):  
Error Function ◽  
Exposure Control ◽  
Field Exposure ◽  
Full Field

Study of 157 nm resists with full field exposure tools

2005 ◽  
Author(s):  
Yayi Wei ◽  
Nickolay Stepanenko ◽  
Michael Sebald ◽  
Christoph Hohle ◽  
Francis M. Houlihan ◽  
...  
Keyword(s):  
Field Exposure ◽  
Full Field

Optical coatings for the 157 nm full-field exposure tool FS1

2004 ◽  
Author(s):  
Minoru Otani ◽  
T. Itho ◽  
S. Kuwabara ◽  
R. Biro ◽  
H Fukushima ◽  
...  
Keyword(s):  
Optical Coatings ◽  
Field Exposure ◽  
Full Field

Automatic exposure control for a slot scanning full field digital mammography system

2005 ◽  
Vol 32 (9) ◽  
pp. 2763-2770 ◽  
Author(s):  
Idris A. Elbakri ◽  
A. V. Lakshminarayanan ◽  
Mike M. Tesic
Keyword(s):  
Digital Mammography ◽  
Exposure Control ◽  
Automatic Exposure Control ◽  
Full Field ◽  
Full Field Digital Mammography

Evaluation of automatic exposure control performance in full-field digital mammography systems using contrast-detail analysis

2012 ◽  
Author(s):  
Ivan M. Suarez Castellanos ◽  
Richard Kaczmarek ◽  
Claudia C. Brunner ◽  
Hugo de Las Heras ◽  
Haimo Liu ◽  
...  
Keyword(s):  
Digital Mammography ◽  
Exposure Control ◽  
Automatic Exposure Control ◽  
Control Performance ◽  
Full Field ◽  
Full Field Digital Mammography

Advances in CPL, collimated plasma source and full field exposure for sub-100-nm lithography

2003 ◽  
Author(s):  
Brent E. Boerger ◽  
Scott McLeod ◽  
Richard A. Forber ◽  
I. C. Edmond Turcu ◽  
Celestino J. Gaeta ◽  
...  
Keyword(s):  
Plasma Source ◽  
Field Exposure ◽  
Full Field

Lithographic Performance of Extreme Ultravolet Full-Field Exposure Tool at Selete

2009 ◽  
Vol 48 (6) ◽  
pp. 06FA02 ◽  
Author(s):  
Kazuo Tawarayama ◽  
Hajime Aoyama ◽  
Takashi Kamo ◽  
Shunko Magoshi ◽  
Yuusuke Tanaka ◽  
...  
Keyword(s):  
Field Exposure ◽  
Full Field

Full-field exposure tools for immersion lithography

2005 ◽  
Author(s):  
Soichi Owa ◽  
Hiroyuki Nagasaka ◽  
Yuuki Ishii ◽  
Kenichi Shiraishi ◽  
Shigeru Hirukawa
Keyword(s):  
Field Exposure ◽  
Full Field ◽  
Immersion Lithography
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