Diffractive lateral-shearing interferometer for phase-shift mask measurement using an excimer laser source

2005 ◽  
Author(s):  
Johannes Schwider ◽  
Gerald Fuetterer ◽  
Norbert Lindlein
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Source ◽  
Lateral Shearing Interferometer ◽  
Lateral Shearing ◽  
Phase Shift Mask

Lateral shearing interferometer for phase-shift mask measurement at 193 nm

2002 ◽  
Author(s):  
Gerald Fuetterer ◽  
M. Lano ◽  
Norbert Lindlein ◽  
Johannes Schwider
Keyword(s):  
Phase Shift ◽  
Lateral Shearing Interferometer ◽  
Lateral Shearing ◽  
193 Nm ◽  
Phase Shift Mask

A Projection-Type Excimer-Laser Crystallization System For Ultra-Large Grain Growth Of Si Thin-Films

1999 ◽  
Vol 558 ◽  
Author(s):  
Chang-Ho Oh ◽  
Mitsuru Nakata ◽  
Masakiyo Matsumura
Keyword(s):  
Thin Films ◽  
Phase Shift ◽  
Excimer Laser ◽  
Laser Crystallization ◽  
Optical Lens ◽  
System A ◽  
Optical Projection ◽  
Crystallization System ◽  
Excimer Laser Crystallization ◽  
Phase Shift Mask

ABSTRACTWe have proposed a new excimer-laser crystallization system based on an optical projection concept. In the proposed system, a collimated excimer-laser light pulse is irradiated to Si thin-films on a glassy substrate, through a phase-shift mask and an optical lens system. Using oneand two-dimensional phase-shift masks, we have examined feasibility of the proposed method.

Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7488-7493 ◽  
Author(s):  
Keisuke Nakazawa ◽  
Masaya Uematsu ◽  
Toshio Onodera ◽  
Kazuya Kamon ◽  
Tohru Ogawa ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

0.10 µm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light

1999 ◽  
Vol 38 (Part 1, No. 5A) ◽  
pp. 2686-2693 ◽  
Author(s):  
Shuji Nakao ◽  
Akihiro Nakae ◽  
Atsumi Yamaguchi ◽  
Kouichirou Tsujita ◽  
Wataru Wakamiya
Keyword(s):  
Pattern Formation ◽  
Phase Shift ◽  
Excimer Laser ◽  
Double Exposure ◽  
Krf Excimer Laser ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

1999 ◽  
Author(s):  
Nobuhito Toyama ◽  
Hiroyuki Miyashita ◽  
Yasutaka Morikawa ◽  
Hiroshi Fujita ◽  
Kazuya Iwase ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Exposure ◽  
High Transmission ◽  
Krf Excimer Laser ◽  
Phase Shift Mask

Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

1999 ◽  
Author(s):  
Nobuhiko Fukuhara ◽  
Takashi Haraguchi ◽  
Koichiro Kanayama ◽  
Tadashi Matsuo ◽  
Susumu Takeuchi ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask
Sign in / Sign up

Export Citation Format

Share Document