Characteristics of negative-tone chemically amplified resist (MES-EN1G) for 50-keV EB mask writing system

2002 ◽  
Author(s):  
Takehiro Kondoh ◽  
Masamitsu Itoh ◽  
Toshiyuki Kai
Keyword(s):  
Writing System ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Naoko Ito ◽  
Daisuke Inokuchi ◽  
Yasushi Nishiyama ◽  
Yuichi Fukushima ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Masahito Tanabe ◽  
Daisuke Inokuchi ◽  
Yuichi Fukushima ◽  
Yasuhiro Okumoto ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

Negative tone chemically amplified resist formulation optimizations for ultra high-resolution lithography

2003 ◽  
Vol 67-68 ◽  
pp. 274-282 ◽  
Author(s):  
J. Saint-Pol ◽  
S. Landis ◽  
C. Gourgon ◽  
S. Tedesco ◽  
R. Hanawa ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024

2004 ◽  
Author(s):  
Mathias Irmscher ◽  
Dirk Beyer ◽  
Joerg Butschke ◽  
Peter Hudek ◽  
Corinna Koepernik ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist
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