Performance and scaling of a dense plasma focus light source for EUV lithography

Author(s):  
Igor V. Fomenkov ◽  
Richard M. Ness ◽  
Ian R. Oliver ◽  
Stephan T. Melnychuk ◽  
Oleh V. Khodykin ◽  
...  
2003 ◽  
Author(s):  
Igor V. Fomenkov ◽  
Richard M. Ness ◽  
Ian R. Oliver ◽  
Stephan T. Melnychuk ◽  
Oleh V. Khodykin ◽  
...  

2002 ◽  
Author(s):  
Igor V. Fomenkov ◽  
William N. Partlo ◽  
Richard M. Ness ◽  
Ian R. Oliver ◽  
Stephan T. Melnychuk ◽  
...  

2004 ◽  
Vol 37 (23) ◽  
pp. 3266-3276 ◽  
Author(s):  
I V Fomenkov ◽  
N Böwering ◽  
C L Rettig ◽  
S T Melnychuk ◽  
I R Oliver ◽  
...  

2000 ◽  
Author(s):  
William N. Partlo ◽  
Igor V. Fomenkov ◽  
Ian R. Oliver ◽  
Daniel L. Birx

2016 ◽  
Vol 113 ◽  
pp. 109-118 ◽  
Author(s):  
M. Chernyshova ◽  
V.A. Gribkov ◽  
E. Kowalska-Strzeciwilk ◽  
M. Kubkowska ◽  
R. Miklaszewski ◽  
...  

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