Optimization of a dense plasma focus device as a light source for EUV lithography

2002 ◽  
Author(s):  
Igor V. Fomenkov ◽  
William N. Partlo ◽  
Richard M. Ness ◽  
Ian R. Oliver ◽  
Stephan T. Melnychuk ◽  
...  
Keyword(s):  
Light Source ◽  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
Euv Lithography

Performance and scaling of a dense plasma focus light source for EUV lithography

2003 ◽  
Author(s):  
Igor V. Fomenkov ◽  
Richard M. Ness ◽  
Ian R. Oliver ◽  
Stephan T. Melnychuk ◽  
Oleh V. Khodykin ◽  
...  
Keyword(s):  
Light Source ◽  
Plasma Focus ◽  
Dense Plasma ◽  
Dense Plasma Focus ◽  
Euv Lithography

Performance and scaling of a dense plasma focus light source for EUV lithography

2004 ◽  
Author(s):  
Igor V. Fomenkov ◽  
Richard M. Ness ◽  
Ian R. Oliver ◽  
Stephan T. Melnychuk ◽  
Oleh V. Khodykin ◽  
...  
Keyword(s):  
Light Source ◽  
Plasma Focus ◽  
Dense Plasma ◽  
Dense Plasma Focus ◽  
Euv Lithography

The effects of pre-ionization on the impurity and x-ray level in a dense plasma focus device

2017 ◽  
Vol 24 (2) ◽  
pp. 022509 ◽  
Author(s):  
D. Piriaei ◽  
H. R. Yousefi ◽  
T. D. Mahabadi ◽  
A. Salar Elahi ◽  
M. Ghoranneviss
Keyword(s):  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
X Ray

On the beam-target nature of neutron production in the FN-II dense plasma focus device

2001 ◽  
Author(s):  
Fermı́n Castillo-Mejı́a ◽  
J. Julio E. Herrera-Velázquez ◽  
José Rangel-Gutierrez
Keyword(s):  
Plasma Focus ◽  
Dense Plasma ◽  
Neutron Production ◽  
Plasma Focus Device ◽  
Dense Plasma Focus

Current sheath dynamics and X-ray emission studies from sequential dense plasma focus device

2000 ◽  
Vol 28 (4) ◽  
pp. 1263-1270 ◽  
Author(s):  
R. Gupta ◽  
S.R. Mohanty ◽  
R.S. Rawat ◽  
M.P. Srivastava
Keyword(s):  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
Current Sheath ◽  
X Ray ◽  
Emission Studies
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