Rinse additives for line-edge roughness control in 193-nm lithography

2004 ◽  
Author(s):  
Dario L. Goldfarb ◽  
Sean D. Burns ◽  
Ryan L. Burns ◽  
Colin J. Brodsky ◽  
Margaret C. Lawson ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Roughness Control ◽  
193 Nm

Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

2003 ◽  
Author(s):  
Tito Chowdhury ◽  
Hanna Bamnolker ◽  
Roni Khen ◽  
Chan-Lon Yang ◽  
Hean-Cheal Lee ◽  
...  
Keyword(s):  
Plasma Source ◽  
Line Edge Roughness ◽  
Metal Gate ◽  
Edge Roughness ◽  
193 Nm

Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system

2000 ◽  
Vol 18 (5) ◽  
pp. 2551 ◽  
Author(s):  
Mark H. Somervell ◽  
David S. Fryer ◽  
Brian Osborn ◽  
Kyle Patterson ◽  
Jeffrey Byers ◽  
...  
Keyword(s):  
Imaging System ◽  
Surface Imaging ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Top Surface Imaging ◽  
193 Nm

CD-SEM measurement line edge roughness test patterns for 193 nm lithography

2003 ◽  
Author(s):  
Benjamin D. Bunday ◽  
Michael Bishop ◽  
John S. Villarrubia ◽  
Andras E. Vladar
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
193 Nm ◽  
Measurement Line

Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

2007 ◽  
Author(s):  
Thomas Wallow ◽  
Alden Acheta ◽  
Yuansheng Ma ◽  
Adam Pawloski ◽  
Scott Bell ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
193 Nm

CD-SEM measurement line-edge roughness test patterns for 193-nm lithography

2003 ◽  
Author(s):  
Benjamin D. Bunday ◽  
Michael Bishop ◽  
John S. Villarrubia ◽  
Andras E. Vladar
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
193 Nm ◽  
Measurement Line

Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists

2004 ◽  
Author(s):  
Monique Ercken ◽  
Leonardus H. A. Leunissen ◽  
Ivan Pollentier ◽  
George P. Patsis ◽  
Vassilios Constantoudis ◽  
...  
Keyword(s):  
Processing Conditions ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
On Line ◽  
193 Nm

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

2008 ◽  
Vol 47 (4) ◽  
pp. 2501-2505 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken-ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness
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