Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system

2000 ◽  
Vol 18 (5) ◽  
pp. 2551 ◽  
Author(s):  
Mark H. Somervell ◽  
David S. Fryer ◽  
Brian Osborn ◽  
Kyle Patterson ◽  
Jeffrey Byers ◽  
...  
Keyword(s):  
Imaging System ◽  
Surface Imaging ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Top Surface Imaging ◽  
193 Nm

Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness

2000 ◽  
Author(s):  
Mark H. Somervell ◽  
David S. Fryer ◽  
Brian Osborn ◽  
Kyle Patterson ◽  
Sungseo Cho ◽  
...  
Keyword(s):  
Imaging Systems ◽  
Surface Imaging ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Top Surface Imaging

Electrical property study of line-edge roughness in top surface imaging process by silylation

1999 ◽  
Author(s):  
Myoung-Soo Kim ◽  
Hyoung-Gi Kim ◽  
Seung Ho Pyi ◽  
Hyeong-Soo Kim ◽  
Ki-Ho Baik ◽  
...  
Keyword(s):  
Electrical Property ◽  
Surface Imaging ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Top Surface Imaging

Resist surface investigations for reduction of Line-Edge-Roughness in Top Surface Imaging technology

1999 ◽  
Vol 46 (1-4) ◽  
pp. 339-343 ◽  
Author(s):  
T. Sugihara ◽  
F. Van Roey ◽  
A.M. Goethals ◽  
K. Ronse ◽  
L. Van den hove
Keyword(s):  
Surface Imaging ◽  
Line Edge Roughness ◽  
Imaging Technology ◽  
Edge Roughness ◽  
Top Surface Imaging

Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

2003 ◽  
Author(s):  
Tito Chowdhury ◽  
Hanna Bamnolker ◽  
Roni Khen ◽  
Chan-Lon Yang ◽  
Hean-Cheal Lee ◽  
...  
Keyword(s):  
Plasma Source ◽  
Line Edge Roughness ◽  
Metal Gate ◽  
Edge Roughness ◽  
193 Nm

Progress in 193-nm top-surface imaging process development

1998 ◽  
Author(s):  
John M. Hutchinson ◽  
Veena Rao ◽  
Guojing Zhang ◽  
Adam R. Pawloski ◽  
Carlos A. Fonseca ◽  
...  
Keyword(s):  
Process Development ◽  
Surface Imaging ◽  
Top Surface Imaging ◽  
193 Nm

Further developments for 193 nm top surface imaging resist

1998 ◽  
Vol 41-42 ◽  
pp. 347-350
Author(s):  
D.W. Johnson ◽  
M.I. Egbe ◽  
C. Chen ◽  
Y. Liao ◽  
S. Dionisio ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging ◽  
193 Nm

Optimization of a Top-Surface Imaging Process for 193-nm Lithography.

1999 ◽  
Vol 12 (4) ◽  
pp. 679-686 ◽  
Author(s):  
Fumikatsu Uesawa ◽  
Masao Saito ◽  
Atsushi Sekiguchi ◽  
Koichi Takeuchi ◽  
Shigeru Moriya
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging ◽  
193 Nm
Sign in / Sign up

Export Citation Format

Share Document