Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists

2004 ◽  
Author(s):  
Monique Ercken ◽  
Leonardus H. A. Leunissen ◽  
Ivan Pollentier ◽  
George P. Patsis ◽  
Vassilios Constantoudis ◽  
...  
Keyword(s):  
Processing Conditions ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
On Line ◽  
193 Nm

Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

2003 ◽  
Author(s):  
Tito Chowdhury ◽  
Hanna Bamnolker ◽  
Roni Khen ◽  
Chan-Lon Yang ◽  
Hean-Cheal Lee ◽  
...  
Keyword(s):  
Plasma Source ◽  
Line Edge Roughness ◽  
Metal Gate ◽  
Edge Roughness ◽  
193 Nm

Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness

2007 ◽  
Vol 46 (9B) ◽  
pp. 6187-6190 ◽  
Author(s):  
Hiroki Yamamoto ◽  
Takahiro Kozawa ◽  
Akinori Saeki ◽  
Kazumasa Okamoto ◽  
Seiichi Tagawa ◽  
...  
Keyword(s):  
Polymer Structure ◽  
Line Edge Roughness ◽  
Acid Diffusion ◽  
Edge Roughness ◽  
On Line

Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3739-3743 ◽  
Author(s):  
Masaki Yoshizawa ◽  
Shigeru Moriya ◽  
Hiroyuki Nakano ◽  
Yuichi Shirai ◽  
Tatsuo Morita ◽  
...  
Keyword(s):  
Electron Beam ◽  
Image Quality ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Latent Image ◽  
Edge Roughness ◽  
On Line

Influence of gate patterning on line edge roughness

2003 ◽  
Vol 21 (6) ◽  
pp. 3140 ◽  
Author(s):  
Leonardus H. A. Leunissen ◽  
Rik Jonckheere ◽  
Kurt Ronse ◽  
Giljam B. Derksen
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
On Line
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