Real-time automation of a dry etching system

1991 ◽  
Author(s):  
Robert H. McCafferty
Keyword(s):  
Real Time ◽  
Dry Etching ◽  
Etching System

Multichannel process monitor for real-time film thickness and rate measurements in dry etching and deposition

Vacuum ◽  
1998 ◽  
Vol 51 (4) ◽  
pp. 497-502 ◽  
Author(s):  
F Heinrich ◽  
D Heinze ◽  
T Kowalski ◽  
P Hoffmann ◽  
P Kopperschmidt
Keyword(s):  
Film Thickness ◽  
Real Time ◽  
Dry Etching ◽  
Process Monitor

P-67: Brief Study of an Electric Force on a Glass Substrate in a Dry Etching System

2006 ◽  
Vol 37 (1) ◽  
pp. 452
Author(s):  
HeeHwan Choe ◽  
Jae-Hong Jeon ◽  
Kang Woong Lee ◽  
Jong Hyun Seo
Keyword(s):  
Glass Substrate ◽  
Dry Etching ◽  
Electric Force ◽  
Etching System

Basic study of a glass substrate in dry etching system

Vacuum ◽  
2006 ◽  
Vol 81 (3) ◽  
pp. 344-346 ◽  
Author(s):  
Hee-Hwan Choe
Keyword(s):  
Glass Substrate ◽  
Dry Etching ◽  
Basic Study ◽  
Etching System

Improvement of NLD mask dry etching system for 100nm node technology

2002 ◽  
Author(s):  
Yoshiyuki Tanaka ◽  
Nobuyuki Yoshioka ◽  
Noriyuki Harashima ◽  
Takaei Sasaki ◽  
Kiyoshi Kuwahara ◽  
...  
Keyword(s):  
Dry Etching ◽  
Etching System

Evaluation of NLD mask dry etching system

1999 ◽  
Author(s):  
Tatsuya Fujisawa ◽  
Takayuki Iwamatsu ◽  
Koji Hiruta ◽  
Hiroaki Morimoto ◽  
Takaei Sasaki ◽  
...  
Keyword(s):  
Dry Etching ◽  
Etching System
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