Plasma parameter estimation from rf impedance measurements in a dry etching system

1983 ◽  
Vol 42 (5) ◽  
pp. 416-418 ◽  
Author(s):  
A. J. van Roosmalen
Author(s):  
I. I. Virtanen ◽  
D. McKay‐Bukowski ◽  
J. Vierinen ◽  
A. Aikio ◽  
R. Fallows ◽  
...  

2006 ◽  
Vol 37 (1) ◽  
pp. 452
Author(s):  
HeeHwan Choe ◽  
Jae-Hong Jeon ◽  
Kang Woong Lee ◽  
Jong Hyun Seo

Vacuum ◽  
2006 ◽  
Vol 81 (3) ◽  
pp. 344-346 ◽  
Author(s):  
Hee-Hwan Choe

2002 ◽  
Author(s):  
Yoshiyuki Tanaka ◽  
Nobuyuki Yoshioka ◽  
Noriyuki Harashima ◽  
Takaei Sasaki ◽  
Kiyoshi Kuwahara ◽  
...  
Keyword(s):  

2014 ◽  
Vol 42 (9) ◽  
pp. 2266-2272 ◽  
Author(s):  
Pooja Gulati ◽  
Ram Prakash ◽  
Udit Narayan Pal ◽  
Seri Sai Geetha ◽  
Vimal Vyas

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