193-nm single-layer resists based on advanced materials

2001 ◽  
Author(s):  
Naomi Shida ◽  
Tohru Ushirogouchi ◽  
Koji Asakawa ◽  
Yoshinori Funaki ◽  
Akira Takaragi ◽  
...  
Keyword(s):  
Single Layer ◽  
Advanced Materials ◽  
193 Nm

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)

2001 ◽  
Author(s):  
Francis M. Houlihan ◽  
Donna Person ◽  
Omkaram Nalamasu ◽  
Ilya Rushkin ◽  
Ognian N. Dimov ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Acrylic Acid ◽  
Butyl Acrylate ◽  
Single Layer ◽  
Tert Butyl ◽  
193 Nm

Multilayer and Fiber Metal Laminate Materials Hydro-Bulging

2018 ◽  
Vol 941 ◽  
pp. 1996-2005
Author(s):  
Ehsan Sherkatghanad ◽  
Li Hui Lang ◽  
Shi Chen Liu
Keyword(s):  
Thickness Distribution ◽  
Single Layer ◽  
Experimental Tests ◽  
Middle Layer ◽  
Composite Fiber ◽  
Advanced Materials ◽  
Carbon Cloth ◽  
Stress Strain ◽  
Aluminum Composite ◽  
Fiber Metal

Advanced materials such as aluminum alloys and composites offer great potential for weight reduction applications in automotive and aerospace vehicles construction. In order to investigate the feasibility of using such materials in the form of laminates, sheet bulging with single-layer aluminum and the aluminum/Composite laminate with the carbon cloth as the middle layer is investigated under uniform liquid pressure conditions. The aluminum sheet stress-strain, wall thickness distribution, carbon fiber radius stress-strain distribution and the effect of die entrance radius etc. are discussed and compared in details. FE results validate that the numerical method can predict the same fracture regions for bulging-blank as observed in experimental tests. Furthermore, the study validates that multi-layer sheet hydro-bulging process with composite fiber as a middle layer is not feasible to form laminates due to rupture of composite fibers near edge regions. Further study is needed to improve the methodology.

A New Single-Layer Resist for 193-nm Lithography

1996 ◽  
Vol 35 (Part 2, No. 4B) ◽  
pp. L528-L530 ◽  
Author(s):  
Koji Nozaki ◽  
Keiji Watanabe ◽  
Takahisa Namiki ◽  
Miwa Igarashi ◽  
Yoko Kuramitsu ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

scholarly journals Single layer resists with enhanced etch resistance for 193 nm lithography.

1994 ◽  
Vol 7 (3) ◽  
pp. 507-516 ◽  
Author(s):  
ROBERT D. ALLEN ◽  
GREGORY M. WALLRAFF ◽  
RICHARD A. DIPIETRO ◽  
DONALD C. HOFER ◽  
RODERICK R. KUNZ
Keyword(s):  
Single Layer ◽  
193 Nm

Novel single-layer photoresist containing cycloolefins for 193 nm

1998 ◽  
Author(s):  
Joo Hyeon Park ◽  
Dong-Chul Seo ◽  
Ki-Dae Kim ◽  
Sun-Yi Park ◽  
Seong-Ju Kim ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

scholarly journals A Commercially Viable 193 nm Single Layer Resist Platform.

1997 ◽  
Vol 10 (3) ◽  
pp. 511-520 ◽  
Author(s):  
F.M. Houlihan ◽  
T. Wallow ◽  
A. Timko ◽  
E. Neria ◽  
R. Hutton ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging

2000 ◽  
Vol 18 (6) ◽  
pp. 3340 ◽  
Author(s):  
Ebo Croffie ◽  
Lei Yuan ◽  
Mosong Cheng ◽  
Andrew Neureuther ◽  
Frank Houlihan ◽  
...  
Keyword(s):  
Structural Changes ◽  
Single Layer ◽  
Photoacid Generators ◽  
193 Nm

scholarly journals Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist

1996 ◽  
Vol 9 (3) ◽  
pp. 475-488 ◽  
Author(s):  
Satoshi Takechi ◽  
Makoto Takahashi ◽  
Akiko Kotachi ◽  
Koji Nozaki ◽  
Ei Yano ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

Novel 193-nm single-layer resist containing a multifunctional monomer

1999 ◽  
Author(s):  
Geunsu Lee ◽  
Cha-Won Koh ◽  
Jae Chang Jung ◽  
Min-Ho Jung ◽  
Hyeong-Soo Kim ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm
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