Chemically amplified resists using the absorption band shift method in conjunction with alicyclic compounds for ArF excimer laser lithography
Keyword(s):
1998 ◽
Vol 11
(3)
◽
pp. 489-492
Keyword(s):
1995 ◽
Vol 13
(6)
◽
pp. 3022
◽
Keyword(s):
1994 ◽
Vol 33
(Part 1, No. 12B)
◽
pp. 7028-7032
◽
Keyword(s):
1999 ◽
Vol 38
(Part 1, No. 5A)
◽
pp. 2997-3000
1991 ◽
Vol 59
(12)
◽
pp. 1026-1030