Chemically amplified resists using the absorption band shift method in conjunction with alicyclic compounds for ArF excimer laser lithography

1999 ◽  
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi

1995 ◽  
Author(s):  
Makoto Nakase ◽  
Takuya Naito ◽  
Koji Asakawa ◽  
Akinori Hongu ◽  
Naomi Shida ◽  
...  

1994 ◽  
Vol 33 (Part 1, No. 12B) ◽  
pp. 7028-7032 ◽  
Author(s):  
Takuya Naito ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi ◽  
Makoto Nakase

1998 ◽  
Author(s):  
Naomi Shida ◽  
Takeshi Okino ◽  
Koji Asakawa ◽  
Tohru Ushirogouchi ◽  
Makoto Nakase

1991 ◽  
Vol 59 (12) ◽  
pp. 1026-1030
Author(s):  
Nobuaki HAYASHI ◽  
Takumi UENO ◽  
Hiroshi SHIRAISHI ◽  
Leo SCHLEGEL ◽  
Takao IWAYANAGI

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