scholarly journals Chemically Amplified Resist for ArF Excimer Laser Lithography Composed of an Alkylsulfonium Salt Photoacid Generator and an Alicyclic Terpolymer.

1996 ◽  
Vol 53 (4) ◽  
pp. 239-247
Author(s):  
Kaichiro NAKANO ◽  
Takeshi OHFUJI ◽  
Katsumi MAEDA ◽  
Shigeyuki IWASA ◽  
Etsuo HASEGAWA
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Arf Excimer Laser ◽  
Photoacid Generator

Transparent photoacid generator (ALS) for ArF excimer laser lithography and chemically amplified resist

1994 ◽  
Author(s):  
Kaichiro Nakano ◽  
Katsumi Maeda ◽  
Shigeyuki Iwasa ◽  
Jun-ichi Yano ◽  
Yukio Ogura ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Arf Excimer Laser ◽  
Photoacid Generator

Phantom Exposure of Chemically Amplified Resist in KrF Excimer Laser Lithography

1999 ◽  
Vol 38 (Part 1, No. 12B) ◽  
pp. 6994-6998 ◽  
Author(s):  
Yoshio Kawai ◽  
Kimiyoshi Deguchi ◽  
Jiro Nakamura
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Krf Excimer Laser

scholarly journals Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

1997 ◽  
Vol 10 (4) ◽  
pp. 585-588 ◽  
Author(s):  
Young-long Kang ◽  
Haiwon Lee ◽  
Eung-Ryul Kim ◽  
Sang-Jun Choi ◽  
Chun-Geun Park
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Arf Excimer Laser
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