Further advances in electron-beam pattern generation technology for 180-nm masks

1998 ◽  
Author(s):  
Frank E. Abboud ◽  
Charles A. Sauer ◽  
Matthew Vernon ◽  
Thomas P. Coleman ◽  
Robert L. Dean ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Generation Technology

Advanced electron-beam pattern generation technology for 180-nm masks

1997 ◽  
Author(s):  
Frank E. Abboud ◽  
Charles A. Sauer ◽  
William Wang ◽  
Matthew Vernon ◽  
Richard Prior ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Generation Technology

Electron beam pattern generation in thin‐film organic dianhydrides

1982 ◽  
Vol 40 (1) ◽  
pp. 93-95 ◽  
Author(s):  
Paul H. Schmidt ◽  
David C. Joy ◽  
Martin L. Kaplan ◽  
William L. Feldmann
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern

Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

1999 ◽  
Author(s):  
Jan M. Chabala ◽  
Frank E. Abboud ◽  
Robert L. Dean ◽  
Suzanne Weaver ◽  
Damon M. Cole ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Writing Strategy

A Fast Turn Around Electron-Beam Pattern Generation System

1973 ◽  
Vol 10 (6) ◽  
pp. 1016-1019 ◽  
Author(s):  
B. P. Piwczyk ◽  
K. G. McQuhae
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Generation System

Device Photolithography: The Electron Beam Pattern Generator

1970 ◽  
Vol 49 (9) ◽  
pp. 2077-2094 ◽  
Author(s):  
W. Samaroo ◽  
J. Raamot ◽  
P. Parry ◽  
G. Robertson
Keyword(s):  
Electron Beam ◽  
Pattern Generator ◽  
Beam Pattern

Raster shaped beam pattern generation

1999 ◽  
Vol 17 (6) ◽  
pp. 2927 ◽  
Author(s):  
S. A. Rishton ◽  
J. K. Varner ◽  
L. H. Veneklasen ◽  
V. Boegli ◽  
A. L. Sagle ◽  
...  
Keyword(s):  
Pattern Generation ◽  
Beam Pattern ◽  
Shaped Beam

A pattern generation technique for serial electron‐beam microfabrication systems

1975 ◽  
Vol 12 (6) ◽  
pp. 1246-1250 ◽  
Author(s):  
F. S. Ozdemir ◽  
C. R. Buckey ◽  
E. D. Wolf
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Generation Technique

scholarly journals Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

2018 ◽  
Vol 9 ◽  
pp. 2581-2598 ◽  
Author(s):  
Lukas Keller ◽  
Michael Huth
Keyword(s):  
Electron Beam ◽  
3D Structure ◽  
Three Dimensional ◽  
Pattern Generation ◽  
Proximity Effects ◽  
Writing Strategies ◽  
Direct Write ◽  
Nanoscale Structures ◽  
Geometrical Description ◽  
Electron Beam Induced Deposition

Fabrication of three-dimensional (3D) nanoarchitectures by focused electron beam induced deposition (FEBID) has matured to a level that highly complex and functional deposits are becoming available for nanomagnetics and plasmonics. However, the generation of suitable pattern files that control the electron beam’s movement, and thereby reliably map the desired target 3D structure from a purely geometrical description to a shape-conforming 3D deposit, is nontrivial. To address this issue we developed several writing strategies and associated algorithms implemented in C++. Our pattern file generator handles different proximity effects and corrects for height-dependent precursor coverage. Several examples of successful 3D nanoarchitectures using different precursors are presented that validate the effectiveness of the implementation.

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