Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications
1998 ◽
Vol 16
(2)
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pp. 881-884
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1999 ◽
Vol 17
(2)
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pp. 433-444
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2005 ◽
Vol 23
(1)
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pp. 168
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1997 ◽
Vol 15
(6)
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pp. 2682
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2002 ◽
Vol 235
(1-4)
◽
pp. 333-339
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1996 ◽
Vol 14
(3)
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pp. 1687
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