Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

1998 ◽  
Author(s):  
Roberto R. Panepucci ◽  
Jose A. Diniz ◽  
Eduardo Carli ◽  
Peter J. Tatschi ◽  
Jacobus W. Swart
Sign in / Sign up

Export Citation Format

Share Document