Deposition of silicon nitride by low-pressure electron cyclotron resonance plasma enhanced chemical vapor deposition in N[sub 2]/Ar/SiH[sub 4]
1997 ◽
Vol 15
(6)
◽
pp. 2682
◽
1999 ◽
Vol 17
(2)
◽
pp. 433-444
◽
2005 ◽
Vol 23
(1)
◽
pp. 168
◽
2002 ◽
Vol 235
(1-4)
◽
pp. 333-339
◽
1996 ◽
Vol 14
(3)
◽
pp. 1687
◽
1995 ◽
Vol 05
(C5)
◽
pp. C5-671-C5-677