Electron cyclotron resonance plasma chemical vapor deposited silicon nitride for micromechanical applications

S. Leclerc; A. Lecours; M. Caron; E. Richard; G. Turcotte; J. F. Currie

doi:10.1116/1.581028

Electron cyclotron resonance plasma chemical vapor deposited silicon nitride for micromechanical applications

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581028 ◽

1998 ◽

Vol 16 (2) ◽

pp. 881-884 ◽

Cited By ~ 8

Author(s):

S. Leclerc ◽

A. Lecours ◽

M. Caron ◽

E. Richard ◽

G. Turcotte ◽

...

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Chemical Vapor Deposited ◽

Resonance Plasma

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Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

10.1117/12.324050 ◽

1998 ◽

Author(s):

Roberto R. Panepucci ◽

Jose A. Diniz ◽

Eduardo Carli ◽

Peter J. Tatschi ◽

Jacobus W. Swart

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-DepositedSiNxFilms for X-Ray Lithography Mask Membrane: As-Deposited Properties and Radiation Stability

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.6908 ◽

1994 ◽

Vol 33 (Part 1, No. 12B) ◽

pp. 6908-6912 ◽

Cited By ~ 1

Author(s):

Jinho Ahn ◽

Katsumi Suzuki ◽

Shinji Tsuboi ◽

Yoshio Yamashita

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Radiation Stability ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Conductance Transient Comparative Analysis of Electron-Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposited SiNx, SiO2/SiNxand SiOxNyDielectric Films on Silicon Substrates

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.66 ◽

2004 ◽

Vol 43 (1) ◽

pp. 66-70 ◽

Cited By ~ 1

Author(s):

Helena Castán ◽

Salvador Dueñas ◽

Juan Barbolla ◽

'Alvaro del Prado ◽

Enrique San Andrés ◽

...

Keyword(s):

Comparative Analysis ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Substrates ◽

Electron Cyclotron Resonance Plasma ◽

Chemical Vapor Deposited ◽

Resonance Plasma

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Electron cyclotron resonance plasma chemical vapor deposition for rugate film manufacturing

10.1117/12.192121 ◽

1994 ◽

Cited By ~ 1

Author(s):

Pavel V. Bulkin ◽

Pieter L. Swart ◽

Beatrys M. Lacquet

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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SiCN alloys deposited by electron cyclotron resonance plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.117887 ◽

1996 ◽

Vol 69 (6) ◽

pp. 773-775 ◽

Cited By ~ 89

Author(s):

F. J. Gómez ◽

P. Prieto ◽

E. Elizalde ◽

J. Piqueras

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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The Optimization of the Deposition Variables for High Photoconductivity a-Si:H Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.6959 ◽

1998 ◽

Vol 37 (Part 1, No. 12B) ◽

pp. 6959-5964

Author(s):

Moonsang Kang ◽

Yongseo Koo ◽

Chul An

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582106 ◽

1999 ◽

Vol 17 (2) ◽

pp. 433-444 ◽

Cited By ~ 17

Author(s):

M. Lapeyrade ◽

M. P. Besland ◽

C. Meva’a ◽

A. Sibaï ◽

G. Hollinger

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Thin Solid Films ◽

10.1016/j.tsf.2008.03.010 ◽

2008 ◽

Vol 516 (21) ◽

pp. 7777-7782 ◽

Cited By ~ 11

Author(s):

C. Biasotto ◽

J.A. Diniz ◽

A.M. Daltrini ◽

S.A. Moshkalev ◽

M.J.R. Monteiro

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Analysis of stress and composition of silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition for microfabrication processes

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1835316 ◽

2005 ◽

Vol 23 (1) ◽

pp. 168 ◽

Cited By ~ 5

Author(s):

E. Cianci ◽

F. Pirola ◽

V. Foglietti

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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