Photoacid generator study for chemically amplified negative resists for high-resolution lithography

1998 ◽  
Author(s):  
Paul M. Dentinger ◽  
Kurtis G. Knapp ◽  
Geoffrey W. Reynolds ◽  
James W. Taylor ◽  
Theodore H. Fedynyshyn ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Photoacid Generator

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning

2019 ◽  
Vol 114 ◽  
pp. 11-18 ◽  
Author(s):  
Qianqian Wang ◽  
Chenying Zhang ◽  
Chenfeng Yan ◽  
Fengjuan You ◽  
Liyuan Wang
Keyword(s):  
High Resolution ◽  
Sulfonium Salt ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

scholarly journals Novel chemically amplified dry-developing imaging materials for high resolution microlithography.

1992 ◽  
Vol 5 (1) ◽  
pp. 17-29 ◽  
Author(s):  
J.M.J. Frchet ◽  
J. Fahey ◽  
S. M. Lee ◽  
S. Matuszczak ◽  
Y. Shacham-Diamand ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified

scholarly journals Performance of a high resolution chemically amplified electron beam resist at various beam energies

2016 ◽  
Vol 155 ◽  
pp. 97-101 ◽  
Author(s):  
D.X. Yang ◽  
A. Frommhold ◽  
A. McClelland ◽  
J. Roth ◽  
M. Rosamond ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Chemically Amplified

Chemically amplified negative resist optimized for high-resolution x-ray lithography

1999 ◽  
Author(s):  
Jiro Nakamura ◽  
Yoshio Kawai ◽  
Kimiyoshi Deguchi ◽  
Masatoshi Oda ◽  
Tadahito Matsuda
Keyword(s):  
High Resolution ◽  
X Ray ◽  
Chemically Amplified

Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy

Biomaterials ◽  
2011 ◽  
Vol 32 (26) ◽  
pp. 6138-6144 ◽  
Author(s):  
Nadia Falzone ◽  
Roger Nathan ◽  
Sverre Myhra ◽  
Radka Chakalova ◽  
Thomas Altebaeumer ◽  
...  
Keyword(s):  
High Resolution ◽  
Targeted Radiotherapy ◽  
Chemically Amplified ◽  
High Resolution Autoradiography ◽  
Chemically Amplified Photoresist
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