On-wafer spectrofluorometric evaluation of the response of photoacid generator compounds in chemically amplified photoresists

2000 ◽  
Vol 18 (1) ◽  
pp. 136 ◽  
Author(s):  
G. D. Feke ◽  
D. Hessman ◽  
R. D. Grober ◽  
B. Lu ◽  
J. W. Taylor
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generator

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

Effect of polymer matrix and photoacid generator on the lithographic properties of chemically amplified photoresist

2014 ◽  
Vol 43 (6) ◽  
pp. 392-400 ◽  
Author(s):  
S. A. Bulgakova ◽  
D. A. Gurova ◽  
S. D. Zaitsev ◽  
E. E. Kulikov ◽  
E. V. Skorokhodov ◽  
...  
Keyword(s):  
Polymer Matrix ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Photoacid Generator

Photopatterning Based on a Chemically Amplified Mechanism Nano-Sheet Films

2012 ◽  
Vol 260-261 ◽  
pp. 707-714
Author(s):  
Tie Sheng Li ◽  
Xiao Hang He ◽  
Ke Ke Zou ◽  
Wen Jian Xu ◽  
Ynag Jie Wu ◽  
...  
Keyword(s):  
Gold Film ◽  
Two Component System ◽  
Lb Films ◽  
Langmuir Blodgett ◽  
Chemically Amplified ◽  
Baking Process ◽  
Exposed Region ◽  
Alcohol Water ◽  
Copolymer Poly ◽  
Photoacid Generator

In the paper, an approach for introducing a photoacid generator (PAG) into Langmuir- Blodgett (LB) films to draw photopatterns is described. The chemically amplified positive-tone resist system used here consisted of two components: a copolymer, poly(iso-pentylmethacrylamide- co-4-t-butyloxylvinylphenylcarbonate) [poly(iPMA-t-BVPC39)] and a photoacid generator (PAG), tri(2,3-dibrompropyl)iso-cyanvrate (TDBPIC). In the two-component system, the acid generated by the photoacid generator (PAG) catalyzes the deprotection reaction of poly(iPMA-t-BVPC39) to re- move the tert-butoxycarbonyl group (t-BOC) in the exposed region during the post exposure baking process, thus rendering the exposure region soluble to alkali aqueous to form a positive tone. Phhot- olithographic properties of the LB films have been evaluated. The patterns can be resolved with a resolution of 1 μm line width by UV irradiation,followed by development with an alkali solution. Quantum yield is determined to be 0.065 and catalytic chain length is also calculated to be 2460. The LB films used above can be used to generate etched gold patterns on a glass substrate using an aqueous iodide, ammonium iodide in alcohol /water，as the etchant. The etch resistance of such LB films is sufficiently good, allowing patterning of a gold film suitable for photomask fabrication.

Photoacid generator study for chemically amplified negative resists for high-resolution lithography

1998 ◽  
Author(s):  
Paul M. Dentinger ◽  
Kurtis G. Knapp ◽  
Geoffrey W. Reynolds ◽  
James W. Taylor ◽  
Theodore H. Fedynyshyn ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Photoacid Generator

A novel photoacid generator for chemically amplified photoresist with ArF exposure

2003 ◽  
Author(s):  
Toshikage Asakura ◽  
Hitoshi Yamato ◽  
Akira Matsumoto ◽  
Peter Murer ◽  
Masaki Ohwa
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Photoacid Generator
Sign in / Sign up

Export Citation Format

Share Document