Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer

2006 ◽  
Author(s):  
Anatol Schwersenz ◽  
Dirk Beyer ◽  
Monika Boettcher ◽  
Kang-Hoon Choi ◽  
Ulrich Denker ◽  
...  
Keyword(s):  
High Resolution ◽  
Direct Write ◽  
Shaped Beam ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

High resolution variable-shaped beam direct write

2007 ◽  
Vol 84 (5-8) ◽  
pp. 774-778 ◽  
Author(s):  
Peter Hahmann ◽  
Lutz Bettin ◽  
Monika Boettcher ◽  
Ulrich Denker ◽  
Thomas Elster ◽  
...  
Keyword(s):  
High Resolution ◽  
Direct Write ◽  
Shaped Beam

High resolution patterning in chemically amplified resists: the effect of film thickness

2001 ◽  
Author(s):  
David R. Medeiros ◽  
Wayne M. Moreau ◽  
Karen E. Petrillo ◽  
Maharshi Chauhan ◽  
Wu-Song Huang ◽  
...  
Keyword(s):  
High Resolution ◽  
Film Thickness ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Chemically amplified resists for high-resolution lithography

2013 ◽  
Vol 42 (3) ◽  
pp. 165-175 ◽  
Author(s):  
S. A. Bulgakova ◽  
M. M. Jons ◽  
A. E. Pestov ◽  
M. N. Toropov ◽  
N. I. Chkhalo ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Silylation and Dry Development of Chemically Amplified Resists SAL601*, AZPN114*1, and Epoxidised Resist (EPR*1) for High Resolution Electron-Beam Lithography

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6873-6876 ◽  
Author(s):  
Evangelia Tegou ◽  
Evangelos Gogolides ◽  
Panagiotis Argitis ◽  
Ioannis Raptis ◽  
Giancarlo Meneghini ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Resolution Electron ◽  
Chemically Amplified Resists

High-Resolution Hybrid Lithography with Negative Tone Chemically Amplified Resists

2004 ◽  
Vol 43 (6B) ◽  
pp. 3974-3980 ◽  
Author(s):  
S. Landis ◽  
S. Pauliac ◽  
J. Saint-Pol ◽  
C. Gourgon ◽  
M. Akita ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

Approach for High-resolution of Chemically Amplified Resists Using Rate Editor Software

2003 ◽  
Vol 42 (Part 1, No. 1) ◽  
pp. 16-22 ◽  
Author(s):  
Atsushi Sekiguchi ◽  
Yoshihisa Sensu ◽  
Yasuhiro Miyake
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

2020 ◽  
Vol 59 (8) ◽  
pp. 086506
Author(s):  
Yuta Ikari ◽  
Kazumasa Okamoto ◽  
Akihiro Konda ◽  
Takahiro Kozawa ◽  
Takao Tamura
Keyword(s):  
Radiation Chemistry ◽  
Heating Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resists
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