Electron Impact-Assisted Carbon Film Growth on Ru(0001):  Implications for Next-Generation EUV Lithography

2007 ◽  
Vol 111 (12) ◽  
pp. 4491-4494 ◽  
Author(s):  
Georgios Kyriakou ◽  
David J. Davis ◽  
Robert B. Grant ◽  
David J. Watson ◽  
Anthony Keen ◽  
...  
Keyword(s):  
Electron Impact ◽  
Film Growth ◽  
Carbon Film ◽  
Next Generation ◽  
Euv Lithography

Carbon film growth on model electron-irradiated MLM cap layer: interaction of benzene and MMA vapor with TiO 2 surface

2009 ◽  
Author(s):  
B. V. Yakshinskiy ◽  
S. Zalkind ◽  
R. A. Bartynski ◽  
R. Caudillo ◽  
T. E. Madey
Keyword(s):  
Film Growth ◽  
Carbon Film ◽  
Layer Interaction ◽  
Cap Layer

Mask absorber for next generation EUV lithography

2020 ◽  
Author(s):  
Meiyi Wu ◽  
Devesh Thakare ◽  
Jean-François de Marneffe ◽  
Patrick Jaenen ◽  
Laurent Souriau ◽  
...  
Keyword(s):  
Next Generation ◽  
Euv Lithography

scholarly journals Amorphous Diamond-Like Carbon Film Growth by KrF-and Arf-Excimer Laser Pld: Correlation with Plume Properties

1995 ◽  
Vol 388 ◽  
Author(s):  
A. A. Puretzky ◽  
D. B. Geohegan ◽  
G. E. Jellison ◽  
M. M. Mcgibbon
Keyword(s):  
Film Growth ◽  
Carbon Film ◽  
Laser Deposition ◽  
Ion Current ◽  
Diamond Like Carbon ◽  
Krf Laser ◽  
Arf Excimer Laser ◽  
Arf Laser ◽  
Carbon Plasma ◽  
Deposited Films

AbstractA comparative study of arF- and KrF-laser deposition of amorphous diamond-like carbon (DLC) films and relevant carbon plasmas has been performed. Spectroscopic ellipsometry and EELS analysis of the DLC films deposited on Si <100> and NaCl substrates were utilized to characterize the high quality arF- and KrF-laser deposited films (up to 84% of sp3 bonded carbon in 7 J/cm2 -ArF-laser DLC film). Gated ICCD imaging, luminescence and ion current probe diagnostics of the carbon plume have revealed quite different properties of carbon plasmas generated by arF- and KrF- lasers. KrF-laser (6.7 J/cm2) irradiation produces a less energetic carbon plasma containing larger amounts of C2 and probably larger clusters compared with arF-laser irradiation at the same energy fluence. We conclude that the more energetic and highly-atomized arF-laser carbon plasma results in the better diamond-like properties.

Design and development of low activation energy based nonchemically amplified resists (n-CARs) for next generation EUV lithography

2016 ◽  
Vol 164 ◽  
pp. 115-122 ◽  
Author(s):  
Satinder K. Sharma ◽  
Satyendra Prakash Pal ◽  
Pulikanti Guruprasad Reddy ◽  
Pawan Kumar ◽  
Subrata Ghosh ◽  
...  
Keyword(s):  
Activation Energy ◽  
Next Generation ◽  
Design And Development ◽  
Euv Lithography

Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

2010 ◽  
Vol 396 (2-3) ◽  
pp. 176-180 ◽  
Author(s):  
G.M. Wright ◽  
R.S. Al ◽  
E. Alves ◽  
L.C. Alves ◽  
N.P. Barradas ◽  
...  
Keyword(s):  
Film Growth ◽  
Carbon Film ◽  
High Density

Carbon film growth on iron substrates by a CVD method

2005 ◽  
Vol 37 (3) ◽  
pp. 310-315 ◽  
Author(s):  
Yun-Shuang Ding ◽  
Wei-Na Li ◽  
Xiong-Fei Shen ◽  
Francis S. Galasso ◽  
Steven L. Suib ◽  
...  
Keyword(s):  
Film Growth ◽  
Carbon Film ◽  
Cvd Method
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