Novel high-contrast phase-shifting masks for EUV interference lithography

2020 ◽  
Author(s):  
Bernhard Lüttgenau ◽  
Sascha Brose ◽  
Serhiy Danylyuk ◽  
Jochen Stollenwerk ◽  
Peter Loosen
Keyword(s):  
Phase Shifting ◽  
Interference Lithography ◽  
High Contrast

Optical phase shifting based on high contrast grating waveguide

2012 ◽  
Author(s):  
Yunjie Li ◽  
Tianbo Sun ◽  
Te Chen ◽  
Hongbin Jiang ◽  
Weiwei Hu ◽  
...  
Keyword(s):  
Phase Shifting ◽  
High Contrast ◽  
Optical Phase ◽  
High Contrast Grating

scholarly journals Ultrahigh spatial-frequency, high-contrast periodic structures produced by interference lithography

1996 ◽  
Author(s):  
H. T. Nguyen ◽  
J. A. Britten ◽  
R. D. Boyd ◽  
B. D. Shore ◽  
M. D. Perry
Keyword(s):  
Spatial Frequency ◽  
Periodic Structures ◽  
Interference Lithography ◽  
High Contrast

scholarly journals Design and manufacturing of a multi-zone phase-shifting coronagraph mask for extremely large telescopes

2020 ◽  
Vol 635 ◽  
pp. A126
Author(s):  
P. Martinez ◽  
M. Beaulieu ◽  
K. Barjot ◽  
O. Guyon ◽  
C. Gouvret ◽  
...  
Keyword(s):  
Focal Plane ◽  
Depth Distribution ◽  
High Efficiency ◽  
Dynamic Range ◽  
Phase Shifting ◽  
Average Error ◽  
High Contrast ◽  
Contrast Imaging ◽  
Zone Depth ◽  
Large Telescopes

Context. High-contrast imaging of exoplanets around nearby stars with future large-segmented apertures requires starlight suppression systems optimized for complex aperture geometries. Future extremely large telescopes (ELTs) equipped with high-contrast instruments operating as close as possible to the diffraction limit will open a bulk of targets in the habitable zone around M-stars. In this context, the phase-induced amplitude apodization complex mask coronagraph (PIAACMC) is a promising concept for high-efficiency coronagraphic imaging at small angular separations with segmented telescopes. Aims. The complex focal plane mask of the PIAACMC is a multi-zone, phase-shifting mask comprised of tiled hexagons that vary in depth. The mask requires micro-fabrication techniques because it is generally made of hundreds micron-scale hexagonal zones with depths ranging over a few microns. We aim to demonstrate that the complex focal plane mask of a PIAACMC with a small inner working angle can be designed and manufactured for segmented apertures. Methods. We report on the numerical design, specifications, manufacturing, and characterization of a PIAACMC complex focal plane mask for the segmented pupil experiment for exoplanet detection facility. Results. Our PIAACMC design offers an inner working angle of 1.3 λ/D and is optimized for a 30% telescope-central-obscuration ratio including six secondary support structures (ESO/ELT design). The fabricated reflective focal plane mask is made of 499 hexagons, and the characteristic size of the mask features is 25 μm, with depths ranging over ±0.4 μm. The mask sag local deviation is measured to an average error of 3 nm and standard deviation of 6 nm rms. The metrological analysis of the mask using interferential microscopy gives access to an in-depth understanding of the component’s optical quality, including a complete mapping of the zone depth distribution zone-depth distribution. The amplitude of the errors in the fabricated mask are within the wavefront control dynamic range. Conclusions. We demonstrate the feasibility of fabricating and characterizing high-quality PIAA complex focal plane masks.

scholarly journals Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region

2014 ◽  
Vol 22 (15) ◽  
pp. 18748 ◽  
Author(s):  
Kanta Kusaka ◽  
Hiroyuki Kurosawa ◽  
Seigo Ohno ◽  
Yozaburo Sakaki ◽  
Kazuyuki Nakayama ◽  
...  
Keyword(s):  
Waveguide Mode ◽  
Visible Region ◽  
Interference Lithography ◽  
Subwavelength Structures ◽  
High Contrast ◽  
Mode Interference ◽  
Lithography Technique

Optimized phase-shifting masks for high-resolution resist patterning by interference lithography

2017 ◽  
Author(s):  
Sascha Brose ◽  
Serhiy Danylyuk ◽  
Lukas Bahrenberg ◽  
Peter Loosen ◽  
Larissa Juschkin ◽  
...  
Keyword(s):  
High Resolution ◽  
Phase Shifting ◽  
Interference Lithography

Ultra-precision phase-shifting locking system of scanning beam interference lithography tool

2019 ◽  
Vol 27 (8) ◽  
pp. 1765-1773
Author(s):  
王磊杰 WANG Lei-jie ◽  
张 鸣 ZHANG Ming ◽  
朱 煜 ZHU Yu ◽  
鲁 森 LU Sen ◽  
杨开明 YANG Kai-ming
Keyword(s):  
Phase Shifting ◽  
Interference Lithography ◽  
Scanning Beam ◽  
Precision Phase ◽  
Ultra Precision ◽  
Scanning Beam Interference Lithography

Resistance Monitor and Control for Vacuum Evaporation of Metals and Carbon

1976 ◽  
Vol 34 ◽  
pp. 572-573
Author(s):  
Russell L. Steere ◽  
Eric F. Erbe ◽  
J. Michael Moseley
Keyword(s):  
Electronic Device ◽  
Point Sources ◽  
High Contrast ◽  
Variable Resistor ◽  
Quality Of Results ◽  
Low Contrast ◽  
Evaporation Source ◽  
And Control ◽  
At Will

We have designed and built an electronic device which compares the resistance of a defined area of vacuum evaporated material with a variable resistor. When the two resistances are matched, the device automatically disconnects the primary side of the substrate transformer and stops further evaporation.This approach to controlled evaporation in conjunction with the modified guns and evaporation source permits reliably reproducible multiple Pt shadow films from a single Pt wrapped carbon point source. The reproducibility from consecutive C point sources is also reliable. Furthermore, the device we have developed permits us to select a predetermined resistance so that low contrast high-resolution shadows, heavy high contrast shadows, or any grade in between can be selected at will. The reproducibility and quality of results are demonstrated in Figures 1-4 which represent evaporations at various settings of the variable resistor.

Confocal laser microscopy of impregnated central nervous system tissue

1988 ◽  
Vol 46 ◽  
pp. 94-95
Author(s):  
J.N. Turner ◽  
M. Siemens ◽  
D. Szarowski ◽  
D.N. Collins
Keyword(s):  
Electron Microscopy ◽  
Central Nervous System ◽  
Nervous System ◽  
Three Dimensional ◽  
Dimensional Structure ◽  
Confocal Laser ◽  
High Contrast ◽  
Central Nervous System Tissue ◽  
Tissue Samples ◽  
Reflected Light

A classic preparation of central nervous system tissue (CNS) is the Golgi procedure popularized by Cajal. The method is partially specific as only a few cells are impregnated with silver chromate usualy after osmium post fixation. Samples are observable by light (LM) or electron microscopy (EM). However, the impregnation is often so dense that structures are masked in EM, and the osmium background may be undesirable in LM. Gold toning is used for a subtle but high contrast EM preparation, and osmium can be omitted for LM. We are investigating these preparations as part of a study to develop correlative LM and EM (particularly HVEM) methodologies in neurobiology. Confocal light microscopy is particularly useful as the impregnated cells have extensive three-dimensional structure in tissue samples from one to several hundred micrometers thick. Boyde has observed similar preparations in the tandem scanning reflected light microscope (TSRLM).

Sign in / Sign up

Export Citation Format

Share Document