Optimized phase-shifting masks for high-resolution resist patterning by interference lithography

2017 ◽  
Author(s):  
Sascha Brose ◽  
Serhiy Danylyuk ◽  
Lukas Bahrenberg ◽  
Peter Loosen ◽  
Larissa Juschkin ◽  
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Keyword(s):  
High Resolution ◽  
Phase Shifting ◽  
Interference Lithography

scholarly journals Generation of high-resolution kagome lattice structures using extreme ultraviolet interference lithography

2012 ◽  
Vol 101 (9) ◽  
pp. 093104 ◽  
Author(s):  
Li Wang ◽  
Bernd Terhalle ◽  
Vitaliy A. Guzenko ◽  
Alan Farhan ◽  
Mohamad Hojeij ◽  
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Keyword(s):  
High Resolution ◽  
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Interference Lithography ◽  
Lattice Structures ◽  
Kagome Lattice ◽  
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High-resolution, superfast 3-D imaging using a phase-shifting method

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Song Zhang ◽  
Yuanzheng Gong ◽  
Jacob Laughner ◽  
Qing Lou ◽  
Igor R. Efimov ◽  
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Phase Shifting ◽  
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High-Resolution Quantum Dot Photopatterning via Interference Lithography Assisted Microstamping

2017 ◽  
Vol 121 (24) ◽  
pp. 13370-13380 ◽  
Author(s):  
Sidney T. Malak ◽  
Guanquan Liang ◽  
Ramathasan Thevamaran ◽  
Young Jun Yoon ◽  
Marcus J. Smith ◽  
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Keyword(s):  
High Resolution ◽  
Quantum Dot ◽  
Interference Lithography

Novel high-contrast phase-shifting masks for EUV interference lithography

2020 ◽  
Author(s):  
Bernhard Lüttgenau ◽  
Sascha Brose ◽  
Serhiy Danylyuk ◽  
Jochen Stollenwerk ◽  
Peter Loosen
Keyword(s):  
Phase Shifting ◽  
Interference Lithography ◽  
High Contrast

scholarly journals High Resolution FPGA DPWM Based on Variable Clock Phase Shifting

2010 ◽  
Vol 25 (5) ◽  
pp. 1115-1119 ◽  
Author(s):  
Angel de Castro ◽  
Elias Todorovich
Keyword(s):  
High Resolution ◽  
Phase Shifting
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