Characterization of a CID-38 charge injection device

1996 ◽  
Author(s):  
Brian S. Backer ◽  
Zoran Ninkov ◽  
Massimiliano Corba
Keyword(s):  
Charge Injection ◽  
Injection Device

Gamma induced dose fluctuations in a charge injection device

1988 ◽  
Vol 35 (6) ◽  
pp. 1302-1306 ◽  
Author(s):  
E.A. Burke ◽  
G.E. Bender ◽  
J.K. Pimbley ◽  
G.P. Summers ◽  
C.J. Dale ◽  
...  
Keyword(s):  
Charge Injection ◽  
Injection Device ◽  
A Charge

scholarly journals Extreme Contrast Ratio Imaging of Sirius with a Charge Injection Device

2016 ◽  
Vol 128 (960) ◽  
pp. 025001 ◽  
Author(s):  
D. Batcheldor ◽  
R. Foadi ◽  
C. Bahr ◽  
J. Jenne ◽  
Z. Ninkov ◽  
...  
Keyword(s):  
Contrast Ratio ◽  
Charge Injection ◽  
Injection Device ◽  
Ratio Imaging ◽  
A Charge

Advances in the Application of Array Detectors for Improved Chemical Analysis, Part II. Rapid Trace Metal Analysis of High Solids Wastewater and Sludge Using a Direct Current Plasma Source Equipped with an Echelle Spectrometer and a Charge-Injection Device Detector

2003 ◽  
Vol 56 (3) ◽  
pp. 133 ◽  
Author(s):  
Jeff Prevatt ◽  
M. Bonner Denton
Keyword(s):  
Trace Metals ◽  
Direct Current ◽  
Charge Injection ◽  
Plasma Source ◽  
High Solids ◽  
Injection Device ◽  
Analytical Technique ◽  
Array Detectors ◽  
Direct Current Plasma ◽  
Echelle Spectrometer

A direct current plasma (DCP) source, equipped with an echelle spectrometer and charge-injection device (CID) detector, was employed for the analysis of trace metals in municipal sludge and wastewater containing high solids. The use of DCP as a plasma source has largely vanished in the past decade due to the popularity of inductively coupled plasma. Resurrecting this robust plasma source and coupling it to a state-of-the-art echelle spectrometer provides for an extremely forgiving analytical technique capable of analysing trace metals rapidly, even in complex high-solid matrices. Instrument performance is further enhanced as the echelle/CID spectrometer provides a simultaneous multi-element fingerprint of contaminants in the waste. The improved design offers increased sensitivity in the far ultraviolet, with overall wavelength coverage from 175 to 800 nm. Furthermore, multi-element analysis is obtained quickly with minimal or no sample preparation, making this the fastest screening technique available.

Selectable one-to-four-port, very high speed 512 x 512 charge-injection device

1991 ◽  
Author(s):  
Jeffrey J. Zarnowski ◽  
Bryn Williams ◽  
Matthew A. Pace ◽  
Michael Joyner ◽  
Joseph Carbone ◽  
...  
Keyword(s):  
High Speed ◽  
Charge Injection ◽  
Injection Device ◽  
Very High

scholarly journals A Measurement Setup and Automated Calculation Method to Determine the Charge Injection Capacity of Implantable Microelectrodes

Sensors ◽  
2018 ◽  
Vol 18 (12) ◽  
pp. 4152 ◽  
Author(s):  
Ana Cisnal ◽  
Juan-Carlos Fraile ◽  
Javier Pérez-Turiel ◽  
Victor Muñoz-Martinez ◽  
Carsten Müller ◽  
...  
Keyword(s):  
Cyclic Voltammetry ◽  
Charge Injection ◽  
Experimental Setup ◽  
Excitable Tissue ◽  
Tissue Resistance ◽  
Voltage Transient ◽  
Transient Measurements ◽  
Functional Electrostimulation

The design of safe stimulation protocols for functional electrostimulation requires knowledge of the “maximum reversible charge injection capacity” of the implantable microelectrodes. One of the main difficulties encountered in characterizing such microelectrodes is the calculation of the access voltage Va. This paper proposes a method to calculate Va that does not require prior knowledge of the overpotential terms and of the electrolyte (or excitable tissue) resistance, which is an advantage for in vivo electrochemical characterization of microelectrodes. To validate this method, we compare the calculated results with those obtained from conventional methods for characterizing three flexible platinum microelectrodes by cyclic voltammetry and voltage transient measurements. This paper presents the experimental setup, the required instrumentation, and the signal processing.

Charge injection using gate-induced-drain-leakage current for characterization of plasma edge damage in CMOS devices

1998 ◽  
Vol 11 (2) ◽  
pp. 211-216 ◽  
Author(s):  
T. Brozek ◽  
V.R. Rao ◽  
A. Sridharan ◽  
J.D. Werking ◽  
Y.D. Chan ◽  
...  
Keyword(s):  
Leakage Current ◽  
Charge Injection ◽  
Plasma Edge ◽  
Edge Damage
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