Model-based proximity effect correction for helium ion beam lithography

2018 ◽  
Author(s):  
Kuen-Yu Tsai ◽  
Chien-Lin Lee ◽  
Sheng-Wei Chien
Keyword(s):  
Proximity Effect ◽  
Ion Beam ◽  
Ion Beam Lithography ◽  
Model Based ◽  
Helium Ion ◽  
Proximity Effect Correction

Large-Scale Focused Helium Ion Beam Lithography

2021 ◽  
Vol 31 (5) ◽  
pp. 1-4
Author(s):  
Jay C. LeFebvre ◽  
Shane A. Cybart
Keyword(s):  
Large Scale ◽  
Ion Beam ◽  
Ion Beam Lithography ◽  
Helium Ion

scholarly journals Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist

2018 ◽  
Vol 193 ◽  
pp. 18-22 ◽  
Author(s):  
Andrea Cattoni ◽  
Dominique Mailly ◽  
Olivier Dalstein ◽  
Marco Faustini ◽  
Gediminas Seniutinas ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Lithography ◽  
Helium Ion

Model-based proximity effect correction for electron-beam direct-write lithography

2010 ◽  
Author(s):  
Chun-Hung Liu ◽  
Pei-Lin Tien ◽  
Philip C. W. Ng ◽  
Yu-Tian Shen ◽  
Kuen-Yu Tsai
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Direct Write ◽  
Model Based ◽  
Proximity Effect Correction

scholarly journals Nanoaperture fabrication in ultra-smooth single-grain gold films with helium ion beam lithography

2020 ◽  
Vol 31 (46) ◽  
pp. 465302
Author(s):  
Chenyi Zhang ◽  
Jinxin Li ◽  
Alex Belianinov ◽  
Zhao Ma ◽  
C Kyle Renshaw ◽  
...  
Keyword(s):  
Ion Beam ◽  
Gold Films ◽  
Ion Beam Lithography ◽  
Helium Ion ◽  
Single Grain

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

2020 ◽  
Vol 12 (17) ◽  
pp. 19616-19624 ◽  
Author(s):  
Rudra Kumar ◽  
Manvendra Chauhan ◽  
Mohamad G. Moinuddin ◽  
Satinder K. Sharma ◽  
Kenneth E. Gonsalves
Keyword(s):  
Electron Beam ◽  
Metal Oxide ◽  
Ion Beam ◽  
Oxide Cluster ◽  
Ion Beam Lithography ◽  
Helium Ion ◽  
Metal Oxide Cluster ◽  
Negative Tone
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