Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

2020 ◽  
Vol 12 (17) ◽  
pp. 19616-19624 ◽  
Author(s):  
Rudra Kumar ◽  
Manvendra Chauhan ◽  
Mohamad G. Moinuddin ◽  
Satinder K. Sharma ◽  
Kenneth E. Gonsalves
Keyword(s):  
Electron Beam ◽  
Metal Oxide ◽  
Ion Beam ◽  
Oxide Cluster ◽  
Ion Beam Lithography ◽  
Helium Ion ◽  
Metal Oxide Cluster ◽  
Negative Tone

Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning

2021 ◽  
Author(s):  
Midathala Yogesh ◽  
Mohamad. G. Moinuddin ◽  
Manvendra Chauhan ◽  
Satinder K. Sharma ◽  
Subrata Ghosh ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Beam ◽  
Ion Beam Lithography ◽  
Helium Ion

Large-Scale Focused Helium Ion Beam Lithography

2021 ◽  
Vol 31 (5) ◽  
pp. 1-4
Author(s):  
Jay C. LeFebvre ◽  
Shane A. Cybart
Keyword(s):  
Large Scale ◽  
Ion Beam ◽  
Ion Beam Lithography ◽  
Helium Ion

scholarly journals Promoting the Cleavage of C–O Bonds at the Interface between a Metal Oxide Cluster and a Co(0001) Support

ACS Catalysis ◽  
2020 ◽  
Vol 10 (24) ◽  
pp. 14722-14731
Author(s):  
Renqin Zhang ◽  
Motahare Athariboroujeny ◽  
Greg Collinge ◽  
Viacheslav Iablokov ◽  
Kirill D. Shumilov ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Oxide Cluster ◽  
Metal Oxide Cluster

Synthesis and X-ray Analysis of Mn–Mo Mixed Metal Oxide Cluster with Cubic Framework

2000 ◽  
Vol 29 (11) ◽  
pp. 1342-1343 ◽  
Author(s):  
Koji Nishikawa ◽  
Isamu Kinoshita ◽  
Takanori Nishioka ◽  
Kiyoshi Isobe
Keyword(s):  
Metal Oxide ◽  
Mixed Metal Oxide ◽  
Oxide Cluster ◽  
X Ray ◽  
Mixed Metal ◽  
Metal Oxide Cluster

Magnetic interactions in a copper(II) trimer encapsulated in a molecular metal oxide cluster

1988 ◽  
Vol 27 (1) ◽  
pp. 59-62 ◽  
Author(s):  
G. F. Kokoszka ◽  
F. Padula ◽  
A. S. Goldstein ◽  
E. L. Venturini ◽  
L. Azevedo ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Magnetic Interactions ◽  
Oxide Cluster ◽  
Metal Oxide Cluster

scholarly journals Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist

2018 ◽  
Vol 193 ◽  
pp. 18-22 ◽  
Author(s):  
Andrea Cattoni ◽  
Dominique Mailly ◽  
Olivier Dalstein ◽  
Marco Faustini ◽  
Gediminas Seniutinas ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Lithography ◽  
Helium Ion
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